H01J 2237/30477
Beam diameter
H01J2237/30477 (Beam diameter) appears on 64 US grants and 73 published applications in this corpus.
Search patents in H01J- Granted patents
- 64
- Published applications
- 73
- Assignees
- 46
- Inventors
- 164
- Latest grant
- 25 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 1 | 0 |
| 2005 | 1 | 3 |
| 2006 | 3 | 5 |
| 2007 | 0 | 7 |
| 2008 | 8 | 8 |
| 2009 | 5 | 6 |
| 2010 | 8 | 3 |
| 2011 | 3 | 4 |
| 2012 | 4 | 1 |
| 2013 | 2 | 3 |
| 2014 | 2 | 1 |
| 2015 | 1 | 4 |
| 2016 | 3 | 3 |
| 2017 | 5 | 2 |
| 2018 | 1 | 3 |
| 2019 | 5 | 2 |
| 2020 | 1 | 4 |
| 2021 | 2 | 3 |
| 2022 | 2 | 1 |
| 2023 | 1 | 3 |
| 2024 | 0 | 1 |
| 2025 | 5 | 3 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Correction of blur variation in a multi-beam writer25 Nov 2025US 12,481,214 B2IMS Nanofabrication GmbH
- Apparatus and method for milling sample30 Sep 2025US 12,431,323 B2JEOL Ltd.
- Additive manufacturing method and apparatus with beam dump1 Jul 2025US 12,343,797 B2Freemelt AB
- Ion milling device18 Feb 2025US 12,230,471 B2Hitachi High-Tech Corporation
- Systems and methods for optimizing full horizontal scanned beam distance7 Jan 2025US 12,191,113 B2APPLIED Materials.Inc.
- Ion implanter and ion implantation method24 Sep 2026US 2026/0290748 A1Sumitomo Heavy Industries Material Solutions Co., Ltd.
- Scanned beam dose rate measurement for ion beam optimization28 May 2026US 2026/0148932 A1APPLIED Materials.Inc.
- Inhomogeneous d-shaped focused ion beams4 Dec 2025US 2025/0372345 A1FEI Company
- Additive manufacturing method and apparatus with beam dump25 Sep 2025US 2025/0296148 A1Freemelt AB
- Minimization of energy spread in focused ion beam (fib) systems15 May 2025US 2025/0157779 A1FEI Company
Most cited
By later US patents
- Charged particle beam exposure apparatus48US 7,692,166 B2Canon Kabushiki Kaisha · 2010
- Charged particle beam pattern generation apparatus and method28US 5,149,976 AHughes Aircraft Company · 1992
- Method and apparatus for modifying a ribbon-shaped ion beam13US 8,058,626 B2Twin Creeks Technologies, Inc. · 2011
- Device and method for milling of material using ions12US 7,132,673 B2E. A. Fischione Instruments, Inc. · 2006
- Irradiation system with ion beam12US 7,351,987 B2SEN Corporation, an SHI and Axcelis Company · 2008