US 7,351,987 B2 · Irradiation system with ion beam

Abstract

An irradiation system comprises a beam generation source, a mass analysis device, a beam transformer, a deflector for scanning which swings the beam reciprocally, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device. According to this invention, a hybrid angular energy filter generating both electric and magnetic fields to bend trajectories is provided as the energy filtering device. A pair of multi-surface energy slit units each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are further provided on a downstream side of the hybrid angular energy filter. It is possible to selectively irradiate a target wafer with high-current beams from low energy to high energy in the conditions where contamination such as neutral particles, different kinds of dopants, ions with different energies, metal, and dust particles is extremely small in amount.

Claims13

Dependent claims

An irradiation system with ion beam which is configured so that a beam from a beam generation source is caused to pass through a mass analysis device and a beam transformer, then pass through a deflector for scanning which swings the beam reciprocally, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device, and then is incident on an irradiation target,

a hybrid angular energy filter generating both electric and magnetic field to bend the beam swung with the deflector in a plane perpendicular to a beam scan plane provided as said energy filtering device, and
a pair of multi-surface energy slit units each having a plurality of energy slits that are switchable therebetween depending on an ion species for irradiation are provided on a downstream side of said hybrid angular energy filter,
wherein said irradiation target is irradiated with pure-energy high-current beams from low energy to high energy in a state where contamination such as neutral particles, different kinds of dopants, metal, and dust particles are in extremely small amounts.

An irradiation system with ion beam which is configured that a beam from a beam generation source is caused to pass through a mass analysis device and a beam transformer, then pass through a deflector for scanning which swings the beam reciprocally, a beam parallelizing device, an acceleration/deceleration device, and an energy filtering device, and then is incident on an irradiation target,

wherein a few sets of mass analysis slits are provided on the downstream side of said mass analysis device, and the number of the sets of said mass analysis slits corresponding to the number of ion species for irradiation, and
each set of mass analysis slits is integrally composed of three slits including a slit for normal implantation, a slit for high mass resolution and low-dose implantation, and a plate for beam centering with a small-diameter opening, said three slits are switchable therebetween depending on the normal implantation, the high resolution and low-dose implantation, and the beam centering, and each set of mass analysis slits is movable horizontally between a mass analysis position and a retreat position and is further movable longitudinally so that said mass analysis position becomes substantially the same for all ion species.

Dependencies are inferred from the claim text.

Irradiation system with ion beam

Life of this patent

Irradiation system with ion beam

Life of this patent

Abstract

Claims13