Substrate analysis system

A substrate analysis system, comprising:

• a miller including a stage, on which a substrate with a pattern layer is positioned, and an ion mill, the ion mill configured to irradiate an ion beam toward a milling region of the pattern layer, the ion beam to irradiate a milling surface from which at least a portion of the pattern layer is removed, and adjust a path of the ion beam according to a scanning profile of the ion beam;
• a depth measurer configured to receive the substrate from the miller, the depth measurer including a measurer configured to measure a milling depth of an analysis region within the milling surface;
• an imager configured to receive the substrate from the depth measurer, the imager including an image capturer configured to capture a two-dimensional image of the analysis region;
• a substrate transferer configured to transfer the substrate between the miller, the depth measurer, and the imager;
• and
• wherein the miller is configured to adjust a-the path of the ion beam so that the ion beam moves horizontally within the milling region according to the scanning profile received based on an intensity map of the ion beam, and
• wherein a moving speed of the ion beam according to the scanning profile decreases toward an edge of the milling region.

A substrate analysis system, comprising:

• a miller including a stage, on which a substrate with a pattern layer is positioned, and an ion mill, the ion mill configured to irradiate an ion beam toward a milling region of the pattern layer, the ion beam to irradiate a milling surface from which at least a portion of the pattern layer is removed, and adjust a path of the ion beam so that the ion beam moves horizontally within the milling region according to a scanning profile of the ion beam;
• a depth measurer configured to receive the substrate from the miller and to measure a milling depth of an analysis region in a central portion of the milling surface;
• an imager configured to receive the substrate from the depth measurer and to capture a plurality of two-dimensional images of the analysis region;
• and
• a substrate transferer configured to transfer the substrate between the miller, the depth measurer, and the imager.