H01J 2237/30461
Pre-calculated
Official title: pre-calculated
H01J2237/30461 (Pre-calculated) appears on 117 US grants and 119 published applications in this corpus.
Search patents in H01J- Granted patents
- 117
- Published applications
- 119
- Assignees
- 45
- Inventors
- 217
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 4 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 5 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 2 | 3 |
| 2003 | 1 | 0 |
| 2004 | 1 | 4 |
| 2005 | 2 | 3 |
| 2006 | 5 | 5 |
| 2007 | 3 | 1 |
| 2008 | 2 | 4 |
| 2009 | 4 | 9 |
| 2010 | 4 | 0 |
| 2011 | 2 | 5 |
| 2012 | 5 | 5 |
| 2013 | 5 | 4 |
| 2014 | 3 | 3 |
| 2015 | 3 | 1 |
| 2016 | 3 | 6 |
| 2017 | 6 | 7 |
| 2018 | 2 | 7 |
| 2019 | 13 | 15 |
| 2020 | 6 | 8 |
| 2021 | 9 | 8 |
| 2022 | 4 | 3 |
| 2023 | 3 | 5 |
| 2024 | 5 | 5 |
| 2025 | 5 | 3 |
| 2026 | 2 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Charged particle beam writing method and charged particle beam writing apparatus26 May 2026US 12,640,341 B2NuFlare Technology, Inc.
- Correction of blur variation in a multi-beam writer25 Nov 2025US 12,481,214 B2IMS Nanofabrication GmbH
- Multiple charged particle beam writing apparatus, multiple charged particle beam writing method, and computer readable recording media storing program25 Nov 2025US 12,482,630 B2NuFlare Technology, Inc.
- Charged particle beam writing method and charged particle beam writing apparatus11 Mar 2025US 12,249,483 B2NuFlare Technology, Inc.
- Charged particle beam writing apparatus, drift amount calculation method, and charged particle beam writing method20 Aug 2026US 2026/0245830 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and multi-charged particle beam writing apparatus18 Jun 2026US 2026/0171355 A1NuFlare Technology, Inc.
- Multiple charged-particle beam irradiation apparatus, multiple charged-particle beam irradiation method, correction map generation apparatus, and correction map generation method28 May 2026US 2026/0148927 A1NuFlare Technology, Inc.
- Multiple charged particle beam writing method, multiple charged particle beam writing apparatus, and non-transitory computer-readable storage medium storing program therein31 Jul 2025US 2025/0246402 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing68US 5,863,682 AKabushiki Kaisha Toshiba · 1999
- Charged particle beam exposure apparatus and method40US 7,005,658 B2Canon Kabushiki Kaisha · 2006
- Electron beam exposure apparatus36US 4,511,980 ATokyo Shibaura Denki Kabushiki Kaisha · 1985
- Charged particle beam pattern generation apparatus and method28US 5,149,976 AHughes Aircraft Company · 1992
- Bias correction for lithography25US 10,444,629 B2D2S, Inc. · 2019