H01J 2237/30455
Correction during exposure
H01J2237/30455 (Correction during exposure) appears on 313 US grants and 291 published applications in this corpus.
Search patents in H01J- Granted patents
- 313
- Published applications
- 291
- Assignees
- 99
- Inventors
- 619
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 3 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 6 | 0 |
| 1993 | 3 | 0 |
| 1994 | 5 | 0 |
| 1995 | 6 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 12 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 7 |
| 2002 | 11 | 6 |
| 2003 | 8 | 4 |
| 2004 | 4 | 10 |
| 2005 | 9 | 14 |
| 2006 | 10 | 11 |
| 2007 | 6 | 9 |
| 2008 | 10 | 21 |
| 2009 | 14 | 19 |
| 2010 | 14 | 4 |
| 2011 | 9 | 10 |
| 2012 | 7 | 7 |
| 2013 | 10 | 12 |
| 2014 | 12 | 9 |
| 2015 | 9 | 19 |
| 2016 | 15 | 14 |
| 2017 | 12 | 16 |
| 2018 | 15 | 19 |
| 2019 | 27 | 25 |
| 2020 | 8 | 10 |
| 2021 | 14 | 10 |
| 2022 | 5 | 8 |
| 2023 | 6 | 7 |
| 2024 | 7 | 6 |
| 2025 | 8 | 7 |
| 2026 | 3 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Correction of thermal expansion in a lithographic device26 May 2026US 12,638,783 B2IMS Nanofabrication GmbH
- Charged particle beam writing method and charged particle beam writing apparatus26 May 2026US 12,640,341 B2NuFlare Technology, Inc.
- Method for handling a particle beam system, particle beam system, computer and computational system24 Feb 2026US 12,562,339 B2Carl Zeiss Microscopy GmbH
- Correction of blur variation in a multi-beam writer25 Nov 2025US 12,481,214 B2IMS Nanofabrication GmbH
- Multiple charged particle beam writing apparatus, multiple charged particle beam writing method, and computer readable recording media storing program25 Nov 2025US 12,482,630 B2NuFlare Technology, Inc.
- Charged particle beam writing apparatus, drift amount calculation method, and charged particle beam writing method20 Aug 2026US 2026/0245830 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and non-transitory computer-readable storage medium storing a program6 Aug 2026US 2026/0229455 A1NuFlare Technology, Inc.
- Abnormality diagnosis method for blanking aperture array substrate and multi-beam writing method2 Jul 2026US 2026/0188609 A1NuFlare Technology, Inc.
- Multi-charged particle beam writing method, and multi-charged particle beam writing apparatus18 Jun 2026US 2026/0171355 A1NuFlare Technology, Inc.
- Multiple charged-particle beam irradiation apparatus, multiple charged-particle beam irradiation method, correction map generation apparatus, and correction map generation method28 May 2026US 2026/0148927 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- Closed-loop process control for electron beam freeform fabrication and deposition processes135US 8,452,073 B2The United States of America as represented by the Administrator of the National Aeronautics and Space Administration · 2013
- Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing68US 5,863,682 AKabushiki Kaisha Toshiba · 1999
- Charged particle beam deflection method with separate stage tracking and stage positional error signals49US 8,384,048 B2Multibeam Corporation · 2013
- Charged particle beam exposure apparatus48US 7,692,166 B2Canon Kabushiki Kaisha · 2010