Charged particle beam writing method and charged particle beam writing apparatus

A charged particle beam writing apparatus comprising:

• a transfer mechanism transferring a substrate;
• a writing chamber receiving the substrate transferred;
• a thermostatic unit maintaining each of the writing chamber and the transfer mechanism at a predetermined temperature;
• an elapsed time calculator calculating an elapsed time from a predetermined starting point in time of transfer of the substrate to the writing chamber;
• a storage storing correction data for irradiation positions to be irradiated with charged particle beams, the irradiation positions being associated with the elapsed time obtained previously;
• a corrector calculating correction amounts for the charged particle beams based on the correction data and the elapsed time at a point in time of irradiation with each of the charged particle beams;
• and
• a writer applying the charged particle beams to positions corrected based on the calculated correction amounts for the charged particle beams to write a pattern on the substrate.