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US 4,511,980 AGranted
Electron beam exposure apparatus
AssigneeTokyo Shibaura Denki Kabushiki Kaisha
InventorSusumu Watanabe
Life of this patent
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Abstract
Dot pattern data stored in the first dot pattern memory is read out by a predetermined number of successive bits at a time under the control of a microprocessor and corrected with respect to an X direction. The corrected dot pattern data is temporarily stored in a main memory. The dot pattern data stored in the main memory is then corrected with respect to a Y direction. The resultant corrected dot pattern data is stored in a second dot pattern memory for use for electron beam blanking control.
Claims4
An electron beam exposure apparatus, comprising:
- a buffer memory for temporarily storing input pattern data,
- a function generator responsive to said buffer memory for converting the pattern data stored in said buffer memory into corresponding dot pattern data according to a predetermined function,
- first memory means for storing dot pattern data obtained from said function generator,
- means for correcting an error occurring in an individual dot in the dot pattern data obtained from said function generator and stored in said first memory means so as to obtain corrected dot pattern data,
- second memory means for storing the corrected dot pattern data, and
- means for directing an electron beam modulated according to the corrected dot pattern data read out from said second memory means to an exposure medium.
3 more elements
Dependencies are inferred from the claim text.