H01J 2237/30405
Details
H01J2237/30405 (Details) appears on 138 US grants and 108 published applications in this corpus.
Search patents in H01J- Granted patents
- 138
- Published applications
- 108
- Assignees
- 60
- Inventors
- 259
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 9 | 0 |
| 1993 | 1 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 5 | 0 |
| 1997 | 4 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 2 | 0 |
| 2001 | 3 | 1 |
| 2002 | 2 | 0 |
| 2003 | 4 | 4 |
| 2004 | 1 | 3 |
| 2005 | 4 | 6 |
| 2006 | 5 | 11 |
| 2007 | 3 | 2 |
| 2008 | 7 | 4 |
| 2009 | 0 | 3 |
| 2010 | 4 | 2 |
| 2011 | 2 | 1 |
| 2012 | 2 | 0 |
| 2013 | 2 | 1 |
| 2014 | 1 | 2 |
| 2015 | 5 | 4 |
| 2016 | 2 | 2 |
| 2017 | 7 | 16 |
| 2018 | 9 | 5 |
| 2019 | 7 | 5 |
| 2020 | 5 | 9 |
| 2021 | 5 | 4 |
| 2022 | 10 | 11 |
| 2023 | 7 | 3 |
| 2024 | 4 | 3 |
| 2025 | 3 | 3 |
| 2026 | 2 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for doping two-dimensional material based on cluster ion implantation25 Aug 2026US 12,719,017 B2Jiangsu Jichuang Atomic Cluster Technology Research Institute Co., Ltd.
- 3D volume inspection method and method of configuring of a 3D volume inspection method30 Jun 2026US 12,670,570 B2Carl Zeiss SMT GmbH
- Plasma processing apparatus and plasma processing method2 Dec 2025US 12,488,964 B2Tohoku University
- Charged particle beam device26 Aug 2025US 12,400,827 B2Hitachi High-Tech Corporation
- Microscopy feedback for improved milling accuracy11 Mar 2025US 12,249,482 B2FEI Company
- Ion implanter and ion implantation method24 Sep 2026US 2026/0290748 A1Sumitomo Heavy Industries Material Solutions Co., Ltd.
- Gradient-based milling for segmented endpointing during lamellae thinning28 May 2026US 2026/0148931 A1FEI Company
- Broad ion beam delayering apparatus with integrated imaging14 May 2026US 2026/0135060 A1Denton Vacuum Inc.
- Automatic Beam Uniformity Correction Through Generative AI Modeling31 Jul 2025US 2025/0246401 A1
- Method for generating writing data, writing data generation apparatus, method of charged-particle beam writing, charged-particle beam writing apparatus, and computer-readable recording medium17 Jul 2025US 2025/0232950 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Method of probing a net of an IC at an optimal probe-point121US 5,530,372 ASchlumberger Technologies, Inc. · 1996
- Optimal probe point placement113US 5,675,499 ASchlumberger Technologies, Inc. · 1997
- Microtip-controlled nanostructure fabrication and multi-tipped field-emission tool for parallel-process nanostructure fabrication64US 5,126,574 AThe United States of America as represented by the Secretary of Commerce · 1992
- Graphical automated machine control and metrology52US 6,889,113 B2FEI Company · 2005
- Charged particle beam lithography system and method47US 5,173,582 AFujitsu Limited · 1992