H01J 2237/30427
Using neural networks or fuzzy logic
Official title: using neural networks or fuzzy logic
H01J2237/30427 (Using neural networks or fuzzy logic) appears on 16 US grants and 14 published applications in this corpus.
Search patents in H01J- Granted patents
- 16
- Published applications
- 14
- Assignees
- 10
- Inventors
- 43
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 5 |
| 2021 | 1 | 2 |
| 2022 | 6 | 4 |
| 2023 | 1 | 0 |
| 2024 | 3 | 0 |
| 2025 | 0 | 2 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for doping two-dimensional material based on cluster ion implantation25 Aug 2026US 12,719,017 B2Jiangsu Jichuang Atomic Cluster Technology Research Institute Co., Ltd.
- Ion beam irradiation apparatus and program therefor9 Apr 2024US 11,955,311 B2Nissin Ion Equipment Co., Ltd.
- Method of aligning a charged particle beam apparatus13 Feb 2024US 11,901,155 B2FEI Company
- Correcting component failures in ion implant semiconductor manufacturing tool2 Jan 2024US 11,862,493 B2APPLIED Materials.Inc.
- System and method for hi-precision ion implantation11 Jul 2023US 11,699,570 B1APPLIED Materials.Inc.
- Gradient-based milling for segmented endpointing during lamellae thinning28 May 2026US 2026/0148931 A1FEI Company
- Automatic Beam Uniformity Correction Through Generative AI Modeling31 Jul 2025US 2025/0246401 A1
- Method for doping two-dimensional material based on cluster ion implantation24 Apr 2025US 2025/0132126 A1Jiangsu Jichuang Atomic Cluster Technology Research Institute Co., Ltd.
- Ion beam irradiation apparatus and program therefor22 Sep 2022US 2022/0301817 A1Nissin Ion Equipment Co., Ltd.
- Correcting component failures in ion implant semiconductor manufacturing tool22 Sep 2022US 2022/0301903 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Microtip-controlled nanostructure fabrication and multi-tipped field-emission tool for parallel-process nanostructure fabrication64US 5,126,574 AThe United States of America as represented by the Secretary of Commerce · 1992
- Multi-tipped field-emission tool for nanostructure fabrication30US 5,015,323 AThe United States of America as represented by the Secretary of Commerce · 1991
- Optical alignment correction using convolutional neural network evaluation of a beam image19US 10,923,318 B2FEI Company · 2021
- Microtip-controlled nanostructure fabrication and multi-tipped field emission tool for parallel-process nanostructure fabrication18US 5,294,465 AThe United States of America as represented by the Secretary of Commerce · 1994
- Intelligent supervision system with expert system for ion implantation process6US 5,859,437 ATaiwan Semiconductor Manufacturing Company.Ltd · 1999