Loading patent…
OwnerNiles Batchelder, Asad Anees +1inventors
InventorsNiles Batchelder, Asad Anees, James Deluca
Estimating the term…
In one embodiment, the disclosure relates to using artificial intelligence (AI) to implement automatic beam current density distribution tuning by obtaining measurements from stationary beam current measurement devices synchronously with the motion of a scanned ion beam to predict the beam tuning settings which will produce a desired beam current density profile. An exemplary method according to the disclosed embodiments include the steps of generating an ion beam as a function of an ion source; scanning the spot ion beam; obtaining signals from a plurality of stationary sensors; synchronizing the beam current measurements with the scanning of the beam to produce an input waveform; predicting the beam tuning controls that will produce the desired beam current density profile; and applying the predicted settings to the beam control system and validating that the beam current density profile matches the desired profile within a specified limit.
An ion implantation system, comprising:
A method for beam uniformity correction in an ion implantation system, the method comprising:
A non-transitory, computer readable storage medium containing instructions stored thereon that, when executed, implement a method of implementing automatic beam current density distribution tuning for an ion implantation system on an implantation workpiece, the instructions comprising:
Dependencies are inferred from the claim text.