US 12,249,482 B2 · Microscopy feedback for improved milling accuracy

Abstract

Methods and apparatus are disclosed for integration of image-based metrology into a milling workflow. A first ion beam milling operation is performed to an edge at a distance from a final target position on a sample. An SEM image of the sample is used to determine a distance between the milled edge and a reference structure on the sample. Based on the determined distance, the ion beam is adjusted to perform a second milling operation to shift the milled edge to the final target position. Extensions to iterative procedures are disclosed. Various geometric configurations and corrections are disclosed. Manufacturing and analytic applications are disclosed in a variety of fields, including read-write head manufacture and TEM sample preparation. Other combinations of imaging and milling tools can be used.

Claims26

Dependent claims

An apparatus comprising:

a milling tool configured to mill a sample using a first particle beam;
an imaging tool configured to generate one or more images of the sample using a second particle beam;
and
a controller configured to:
cause the milling tool to mill the sample to a first edge, using a first value of a control parameter;
determine a second value of the control parameter changed from the first value by an amount based on a distance between the first edge and a target position, wherein the distance is determined from an image, acquired by the imaging tool, of a surface of the sample, and wherein the image indicates, on the surface, the first edge and the target position;
and
cause the milling tool to mill the sample to a second edge, using the second value of the control parameter.

5 more elements

Dependencies are inferred from the claim text.

Microscopy feedback for improved milling accuracy

Life of this patent

Microscopy feedback for improved milling accuracy

Life of this patent

Abstract

Claims26