H01J 2237/2817
Pattern inspection
H01J2237/2817 (Pattern inspection) appears on 1,261 US grants and 1,376 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,261
- Published applications
- 1,376
- Assignees
- 161
- Inventors
- 1,846
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 5 | 0 |
| 1997 | 3 | 0 |
| 1998 | 6 | 0 |
| 1999 | 8 | 0 |
| 2000 | 7 | 0 |
| 2001 | 15 | 16 |
| 2002 | 29 | 38 |
| 2003 | 51 | 41 |
| 2004 | 34 | 49 |
| 2005 | 55 | 50 |
| 2006 | 57 | 69 |
| 2007 | 43 | 68 |
| 2008 | 63 | 55 |
| 2009 | 40 | 56 |
| 2010 | 46 | 34 |
| 2011 | 46 | 46 |
| 2012 | 51 | 55 |
| 2013 | 39 | 41 |
| 2014 | 45 | 29 |
| 2015 | 42 | 52 |
| 2016 | 41 | 45 |
| 2017 | 51 | 57 |
| 2018 | 44 | 42 |
| 2019 | 57 | 72 |
| 2020 | 65 | 95 |
| 2021 | 77 | 56 |
| 2022 | 52 | 77 |
| 2023 | 45 | 71 |
| 2024 | 49 | 56 |
| 2025 | 57 | 65 |
| 2026 | 34 | 41 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Charged particle gun and charged particle beam apparatus29 Sep 2026US 12,749,643 B2Hitachi High-Tech Corporation
- Discharging a region of a sample29 Sep 2026US 12,749,648 B2Applied Materials Israel Ltd.
- Processor system capable of communicating with multicharged particle beam device and method thereof25 Aug 2026US 12,719,014 B2Hitachi High-Tech Corporation
- Charged-particle optical device18 Aug 2026US 12,712,147 B2ASML Netherlands B. V.
- System and method for detecting defects on a wafer and related non-transitory computer-readable medium1 Oct 2026US 2026/0305262 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Multi-beam charged particle microscope for inspection with reduced charging effects17 Sep 2026US 2026/0279715 A1
- Charged particle beam device17 Sep 2026US 2026/0279717 A1Samsung Electronics Co., Ltd.
- Method of Dispositioning and Control of a Semiconductor Manufacturing Process10 Sep 2026US 2026/0269176 A1Fractilia, LLC
- Method of Dispositioning and Control of a Semiconductor Manufacturing Process27 Aug 2026US 2026/0253833 A1Fractilia, LLC
Most cited
By later US patents
- Electron beam inspection system and method266US 5,578,821 AKLA Instruments Corporation · 1996
- Feature-based defect detection256US 6,539,106 B1APPLIED Materials.Inc. · 2003
- Method of detecting defects in patterned substrates227US 6,252,412 B1Schlumberger Technologies, Inc. · 2001
- Stepper type test structures and methods for inspection of semiconductor integrated circuits184US 6,633,174 B1KLA-Tencor Corporation · 2003
- Microstructure defect detection182US 6,232,787 B1Schlumberger Technologies, Inc. · 2001