H01J 2237/2809
Characterised by the imaging problems involved
Official title: characterised by the imaging problems involved
H01J2237/2809 (Characterised by the imaging problems involved) appears on 338 US grants and 357 published applications in this corpus.
Search patents in H01J- Granted patents
- 338
- Published applications
- 357
- Assignees
- 76
- Inventors
- 684
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 1 |
| 2002 | 0 | 3 |
| 2003 | 6 | 2 |
| 2004 | 5 | 9 |
| 2005 | 5 | 6 |
| 2006 | 8 | 11 |
| 2007 | 6 | 8 |
| 2008 | 11 | 7 |
| 2009 | 9 | 12 |
| 2010 | 9 | 7 |
| 2011 | 7 | 13 |
| 2012 | 11 | 10 |
| 2013 | 13 | 16 |
| 2014 | 11 | 17 |
| 2015 | 20 | 23 |
| 2016 | 20 | 19 |
| 2017 | 20 | 14 |
| 2018 | 14 | 15 |
| 2019 | 16 | 27 |
| 2020 | 30 | 23 |
| 2021 | 24 | 25 |
| 2022 | 16 | 23 |
| 2023 | 16 | 28 |
| 2024 | 17 | 19 |
| 2025 | 15 | 12 |
| 2026 | 17 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Charged particle beam device and imaging method18 Aug 2026US 12,712,149 B2Hitachi High-Tech Corporation
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Charged particle beam system23 Jun 2026US 12,665,161 B2Hitachi High-Tech Corporation
- Proximity-electrode, charged particle beam device and method for inspecting and/or imaging a sample16 Jun 2026US 12,658,401 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Determining a position of an object in a beam apparatus16 Jun 2026US 12,658,406 B2Carl Zeiss Microscopy GmbH
- Scanning electron microscope and specimen observation method10 Sep 2026US 2026/0269169 A1Hitachi High-Tech Corporation
- Method of operating scanning electron microscope (sem) and method of manufacturing semiconductor device using the same11 Jun 2026US 2026/0162931 A1Samsung Electronics Co., Ltd.
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
- Foil lens correctors, charged particle microscope systems including the same, and associated methods2 Apr 2026US 2026/0094784 A1FEI Company
- Scanning electron microscope with enhanced three-dimensional imaging26 Mar 2026US 2026/0088247 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Microstructure defect detection182US 6,232,787 B1Schlumberger Technologies, Inc. · 2001
- Precise metrology with adaptive milling154US 8,222,599 B1Western Digital (Fremont), LLC · 2012
- Scanning electron microscope and method for production of semiconductor device by using the same90US 5,412,210 AHitachi, Ltd. · 1995
- Focused ion beam metrology75US 5,798,529 AInternational Business Machines Corporation · 1998
- Image-formation apparatus using charged particle beams under various focus conditions68US 6,538,249 B1Hitachi, Ltd. · 2003