H01J 2237/281
Bottom of trenches or holes
H01J2237/281 (Bottom of trenches or holes) appears on 117 US grants and 109 published applications in this corpus.
Search patents in H01J- Granted patents
- 117
- Published applications
- 109
- Assignees
- 27
- Inventors
- 248
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 2 |
| 2003 | 4 | 1 |
| 2004 | 3 | 5 |
| 2005 | 3 | 4 |
| 2006 | 4 | 6 |
| 2007 | 3 | 4 |
| 2008 | 5 | 2 |
| 2009 | 2 | 5 |
| 2010 | 5 | 0 |
| 2011 | 3 | 3 |
| 2012 | 1 | 0 |
| 2013 | 3 | 3 |
| 2014 | 1 | 6 |
| 2015 | 2 | 6 |
| 2016 | 6 | 5 |
| 2017 | 6 | 3 |
| 2018 | 4 | 2 |
| 2019 | 4 | 11 |
| 2020 | 11 | 9 |
| 2021 | 12 | 13 |
| 2022 | 9 | 6 |
| 2023 | 6 | 6 |
| 2024 | 3 | 1 |
| 2025 | 4 | 2 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam device and imaging method18 Aug 2026US 12,712,149 B2Hitachi High-Tech Corporation
- Proximity-electrode, charged particle beam device and method for inspecting and/or imaging a sample16 Jun 2026US 12,658,401 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Charged particle beam apparatus13 Jan 2026US 12,525,430 B2Hitachi High-Tech Corporation
- Method of operating scanning electron microscope (SEM) and method of manufacturing semiconductor device using the same15 Jul 2025US 12,362,138 B2Samsung Electronics Co., Ltd.
- Method of enhancing contrast while imaging high aspect ratio structures in electron microscopy8 Apr 2025US 12,272,607 B2APPLIED Materials.Inc.
- Scanning electron microscope and specimen observation method10 Sep 2026US 2026/0269169 A1Hitachi High-Tech Corporation
- Method of operating scanning electron microscope (sem) and method of manufacturing semiconductor device using the same11 Jun 2026US 2026/0162931 A1Samsung Electronics Co., Ltd.
- Scanning electron microscope with enhanced three-dimensional imaging26 Mar 2026US 2026/0088247 A1Samsung Electronics Co., Ltd.
- Charged particle beam device and control method thereof26 Feb 2026US 2026/0058088 A1Hitachi High-Tech Corporation
- Pattern Measurement Method, Measurement System, and Computer-Readable Medium23 Oct 2025US 2025/0327663 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Microstructure defect detection182US 6,232,787 B1Schlumberger Technologies, Inc. · 2001
- Precise metrology with adaptive milling154US 8,222,599 B1Western Digital (Fremont), LLC · 2012
- Scanning electron microscope and method for production of semiconductor device by using the same90US 5,412,210 AHitachi, Ltd. · 1995
- Focused ion beam metrology75US 5,798,529 AInternational Business Machines Corporation · 1998
- Image-formation apparatus using charged particle beams under various focus conditions68US 6,538,249 B1Hitachi, Ltd. · 2003