Charged particle beam system
AssigneeHitachi High-Tech Corporation
InventorsHeita Kimizuka, Natsuki Tsuno, Yasuhiro Shirasaki, Minami Uchiho
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Abstract
An object of the present disclosure is to provide a charged particle beam system capable of obtaining information about a sample by using a feature amount on an observed image caused by light interference, light diffraction, light standing waves, and the like caused by irradiating a sample with light, and the like. In the charged particle beam system according to the present disclosure, a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample, and a second feature amount of the sample is obtained by using the first feature amount (see FIG. 6).
Claims19
A charged particle beam system that generates an observed image of a sample by irradiating the sample with a charged particle beam, the system comprising:
- a charged particle source that irradiates the sample with the charged particle beam;
- a first light irradiation unit that irradiates the sample with a first light;
- a detector that detects secondary charged particles generated by irradiating the sample with the charged particle beam and outputs a detection signal representing the intensity of the secondary charged particles;
- and
- a computer system that generates the observed image using the detection signal, wherein
- the computer system extracts from the observed image a first feature amount resulting from interference of the first light, diffraction of the first light, or standing waves of the first light caused by irradiating the sample with the first light, and
- the computer system acquires a second feature amount of the sample using the first feature amount.
Dependencies are inferred from the claim text.