H01J 2237/20292
Means for position and/or orientation registration
H01J2237/20292 (Means for position and/or orientation registration) appears on 177 US grants and 212 published applications in this corpus.
Search patents in H01J- Granted patents
- 177
- Published applications
- 212
- Assignees
- 72
- Inventors
- 458
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 2 |
| 2002 | 0 | 4 |
| 2003 | 3 | 4 |
| 2004 | 7 | 5 |
| 2005 | 6 | 7 |
| 2006 | 7 | 5 |
| 2007 | 3 | 5 |
| 2008 | 6 | 9 |
| 2009 | 4 | 6 |
| 2010 | 7 | 4 |
| 2011 | 2 | 4 |
| 2012 | 4 | 4 |
| 2013 | 3 | 5 |
| 2014 | 8 | 9 |
| 2015 | 4 | 18 |
| 2016 | 7 | 8 |
| 2017 | 14 | 11 |
| 2018 | 12 | 8 |
| 2019 | 9 | 14 |
| 2020 | 14 | 10 |
| 2021 | 9 | 9 |
| 2022 | 11 | 15 |
| 2023 | 4 | 12 |
| 2024 | 5 | 12 |
| 2025 | 12 | 11 |
| 2026 | 8 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of sample preparation and analysis25 Aug 2026US 12,719,012 B2FEI Company
- Detection device, processing system, and transfer method11 Aug 2026US 12,706,280 B2Tokyo Electron Limited
- Orientation tool for electron backscatter diffraction21 Apr 2026US 12,609,275 B2GM Global Technology Operations LLC
- Multi charged particle beam writing method and multi charged particle beam writing apparatus21 Apr 2026US 12,609,278 B2NuFlare Technology, Inc.
- Transfer device and analysis system24 Mar 2026US 12,586,751 B2Hitachi High-Tech Corporation
- Charged Particle Beam Device and Method for Producing and Observing Sample Piece6 Aug 2026US 2026/0229446 A1Hitachi High-Tech Corporation
- Conveying Method, Conveyance Device, and Analysis System30 Jul 2026US 2026/0221378 A1Hitachi High-Tech Corporation
- Beam Apparatus, Lamella Extraction Apparatus, Lamella Observation System, and Lamella Preparation Method23 Jul 2026US 2026/0213128 A1Hitachi High-Tech Corporation
- Ion implanter9 Jul 2026US 2026/0198260 A1Nissin Ion Equipment Co., Ltd.
- Tilt measurement in particle microscope systems11 Jun 2026US 2026/0162930 A1
Most cited
By later US patents
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Charged particle beam deflection method with separate stage tracking and stage positional error signals49US 8,384,048 B2Multibeam Corporation · 2013
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus34US 7,692,144 B2Hitachi, Ltd. · 2010
- Electron beam exposure apparatus28US 4,063,103 ATokyo Shibaura Electric Co., Ltd. · 1977
- Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatus25US 6,333,510 B1Hitachi, Ltd. · 2001