US 4,063,103 A · Electron beam exposure apparatus

Abstract

A radiant beam exposure apparatus forms a desired pattern on a workpiece disposed on a carriage movable in both directions X and Y which intersect at a right angle. The distance over which the carriage moves is measured by a laser interferometer. In response to the output of the interferometer, a pulse generating circuit generates one pulse for each n/m wavelength of laser light. The pulse signal is supplied from the pulse generating circuit to a memory device storing information corresponding to the pattern and at the same time to a deflection signal generator. Upon receipt of the pulse signal, the memory device reads out the information, and the deflection signal generator generates a deflection signal. The information signal is supplied from the memory device to a blanking signal generator. In response to the information signal, the blanking signal generator generates a blanking signal, which is supplied together with the deflection signal to a radiant beam scanning device, thereby forming the desired pattern on the workpiece.

Claims18

Dependent claims

A radiant beam exposure apparatus for forming a desired pattern on a workpiece by means of a radiant beam comprising

a radiant beam gum for projecting a radiant beam onto the workpiece;
a carriage for supporting the workpiece in the directions X and Y which intersect at a right angle;
a carriage movement detector for detecting the movement of the carriage to generate a pulse signal which corresponds to the amount and speed of the carriage movement;
a memory device for storing information corresponding to the desired pattern and for reading out the information in response to the pulse signal from the carriage movement detector;
a blanking signal generator for generating, in response to the information read out from the memory device, a blanking signal which corresponds to the information;
a blanking means for blanking the radiant beam in response to the blanking signal;
a deflection signal generator for generating a deflection signal in responsive to the pulse signal from the carriage movement detector;
deflection means for deflecting the radiant beam in response to the deflection signal from the deflection signal generator;
and
a thermostatic device for maintaining the carriage and the workpiece at a substantially constant temperature and having means for permitting flow of a liquid kept at a substantially constant temperature with a deviation of about 0.1.degree. C.

7 more elements

A radiant beam exposure apparatus for forming a desired pattern on a workpiece by means of a radiant beam comprising

a source of a radiant beam including a radiant beam gun for projecting a radiant beam onto the workpiece, blanking electrodes, deflection electrodes and an electron lens system;
a carriage for supporting the workpiece and movable in directions X and Y which intersect at a right angle;
a driving device for driving the carriage in the directions X and Y;
a laser interferometer for measuring the amount of the carriage movement using a laser light so as to generate a pulse signal which corresponds to the amount and speed of the carriage movement;
a control pulse generating circuit for producing one pulse for each n/m wavelength of the laser light in response to the pulse signal, m and n being selected to have such value that n/m wavelength of the laser light is substantially equal to a minimum length of the pattern;
a program control device comprising a memory unit adapted to store information in the form of a binary signal corresponding to the desired pattern and to read out the pattern information in response to the pulse signal from the control pulse generating circuit;
a blanking signal generator for generating, in response to the pattern information from the program control device, a blanking signal which corresponds to the pattern information, the blanking signal being supplied to the blanking electrodes for blanking the radiant beam;
and
a deflection signal generator for generating a deflection signal in response to the pulse signal from the control pulse generating circuit, the deflection signal being supplied to the deflection electrodes for deflecting the radiant beam.

6 more elements

Dependencies are inferred from the claim text.

Electron beam exposure apparatus

Life of this patent

Electron beam exposure apparatus

Life of this patent

Abstract

Claims18