Orientation tool for electron backscatter diffraction

A method for initiating an electron backscatter diffraction measurement in a chamber of a scanning electron microscope (SEM), the method comprising:

• providing a system for evaluating a sample within the SEM, the system comprising:
• a locating collar configured to be fixed within the SEM;
• a sample mount having a back surface, a polished surface, and a side surface extended from the back surface to the polished surface, wherein a sample evaluation area is exposed within the polished surface;
• an orientation tool disposed within the locating collar, the orientation tool comprising:
• a body having a bottom surface and a top surface;
• an angled flat face extending from adjacent the bottom surface to the top surface;
• and
• a mount portion formed in the body between the top surface and the angled flat face, the mount portion defined by a wall and a support surface, wherein the wall extends from the top surface to the support surface and the support surface extends from the wall to the angled flat face, wherein the wall is angled at 20 degrees with respect to an imaginary vertical line perpendicular to the bottom surface, and
• wherein the sample mount is disposed within the mount portion and the back surface abuts the wall, the side surface abuts the support surface, and the polished surface is angled at 20 degrees relative to a vertical axis of the SEM;
• mounting the sample in the sample mount near an edge of the polished surface;
• placing the sample mount into the mount portion of the orientation tool, wherein the orientation tool orients the sample at an angle of 20 degrees from a vertical axis of the orientation tool;
• placing the orientation tool and sample on the sample mount into the locating collar;
• and
• placing the locating collar with the sample into the chamber of the SEM with the sample facing toward an EBSD detector.

A system for evaluating a sample within a scanning electron microscope (SEM), the system comprising:

• a locating collar configured to be fixed within the SEM, wherein the locating collar includes a slot formed in an upper surface of the locating collar;
• a sample mount having a back surface, a polished surface, and a side surface extended from the back surface to the polished surface, wherein a sample evaluation area is exposed within the polished surface;
• an orientation tool disposed within the locating collar, the orientation tool comprising:
• a body having a bottom surface and a top surface;
• an angled flat face extending from adjacent the bottom surface to the top surface;
• and
• a mount portion formed in the body between the top surface and the angled flat face, the mount portion defined by a wall and a support surface, wherein the wall extends from the top surface to the support surface and the support surface extends from the wall to the angled flat face, wherein the wall is angled at 20 degrees with respect to an imaginary vertical line perpendicular to the bottom surface, and
• wherein the sample mount is disposed within the mount portion and the back surface abuts the wall, wherein the support surface and side surface are complimentary shapes, the side surface abuts the support surface, and the polished surface is angled at 20 degrees relative to a vertical axis of the SEM.