H01J 2237/20207
Tilt
H01J2237/20207 (Tilt) appears on 247 US grants and 325 published applications in this corpus.
Search patents in H01J- Granted patents
- 247
- Published applications
- 325
- Assignees
- 107
- Inventors
- 708
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 2 |
| 2003 | 1 | 2 |
| 2004 | 5 | 6 |
| 2005 | 3 | 4 |
| 2006 | 4 | 5 |
| 2007 | 4 | 4 |
| 2008 | 3 | 10 |
| 2009 | 2 | 10 |
| 2010 | 11 | 9 |
| 2011 | 5 | 13 |
| 2012 | 6 | 9 |
| 2013 | 9 | 13 |
| 2014 | 8 | 14 |
| 2015 | 17 | 14 |
| 2016 | 16 | 18 |
| 2017 | 14 | 16 |
| 2018 | 15 | 10 |
| 2019 | 15 | 23 |
| 2020 | 20 | 17 |
| 2021 | 12 | 27 |
| 2022 | 20 | 22 |
| 2023 | 16 | 21 |
| 2024 | 9 | 18 |
| 2025 | 17 | 25 |
| 2026 | 11 | 13 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle beam device15 Sep 2026US 12,738,448 B2Hitachi High-Tech Corporation
- Method of sample preparation and analysis25 Aug 2026US 12,719,012 B2FEI Company
- Controlling etch angles by substrate rotation in angled etch tools30 Jun 2026US 12,669,635 B2APPLIED Materials.Inc.
- Tilting element of manipulation stage30 Jun 2026US 12,671,055 B2Tescan Group A.S.
- Analysis system9 Jun 2026US 12,651,724 B2Hitachi High-Tech Corporation
- Line edge smoothing with jittered twist13 Aug 2026US 2026/0237589 A1Axcelis Technologies, Inc.
- Vertically oriented implanter architecture for contactless backside substrate processing6 Aug 2026US 2026/0229445 A1
- Charged Particle Beam Device and Method for Producing and Observing Sample Piece6 Aug 2026US 2026/0229446 A1Hitachi High-Tech Corporation
- Upwardly-oriented beamline implanter architecture for contactless backside substrate processing25 Jun 2026US 2026/0179876 A1
- Angle-Actuated Capacitive Sensor for Accurate Angled Deposition or Etch Process Monitoring25 Jun 2026US 2026/0179891 A1
Most cited
By later US patents
- Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices92US 6,940,582 B1Nikon Corporation · 2005
- End station for a parallel beam ion implanter69US 5,229,615 AEaton Corporation · 1993
- Six-degree-of-freedom multi-axes positioning apparatus32US 5,901,936 ASandia Corporation · 1999
- Double tilt and rotate specimen holder for a transmission electron microscope31US 6,388,262 B1Gatan, Inc. · 2002
- Ion beam measurement systems and methods for ion implant dose and uniformity control25US 6,992,309 B1Axcelis Technologies, Inc. · 2006