Upwardly-oriented beamline implanter architecture for contactless backside substrate processing

Abstract

A beamline ion implanter is disclosed. The beamline ion implanter generates an upwardly oriented ion beam that is used to impact a workpiece. In some embodiments, a deflector that uses magnets or biased electrodes is used to deflect the ion beam from a substantially horizontal plane to the upward orientation. In other embodiments, the beamline ion implanter is designed so that the ion beam travels substantially within a vertical plane through its entire path from the ion source to the workpiece. The workpiece is mounted on a hollow workpiece holder so that the upwardly oriented ion beam strikes the side of the workpiece that is resting on the workpiece holder.

Dependencies are inferred from the claim text.