H01J 2237/103
Characterised by lens type
Official title: characterised by lens type
H01J2237/103 (Characterised by lens type) appears on 94 US grants and 94 published applications in this corpus.
Search patents in H01J- Granted patents
- 94
- Published applications
- 94
- Assignees
- 48
- Inventors
- 215
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 2 |
| 2003 | 3 | 1 |
| 2004 | 4 | 4 |
| 2005 | 5 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 4 |
| 2010 | 1 | 2 |
| 2011 | 1 | 2 |
| 2012 | 2 | 4 |
| 2013 | 3 | 3 |
| 2014 | 6 | 4 |
| 2015 | 3 | 4 |
| 2016 | 3 | 5 |
| 2017 | 6 | 9 |
| 2018 | 5 | 2 |
| 2019 | 6 | 4 |
| 2020 | 8 | 10 |
| 2021 | 8 | 4 |
| 2022 | 2 | 6 |
| 2023 | 4 | 8 |
| 2024 | 4 | 2 |
| 2025 | 4 | 7 |
| 2026 | 6 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Multiple particle beam system with a mirror mode of operation, method for operating a multiple particle beam system with a mirror mode of operation and associated computer program product14 Jul 2026US 12,683,117 B2Carl Zeiss MultiSEM GmbH
- Adjustable permanent magnetic lens having shunting device30 Jun 2026US 12,671,054 B2IMS Nanofabrication GmbH
- Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus19 May 2026US 12,633,489 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Magnetic lenses, charged particle microscope systems including the same, and associated methods19 May 2026US 12,633,490 B2FEI Company
- Multiple particle beam system with a contrast correction lens system14 Apr 2026US 12,603,245 B2Carl Zeiss MultiSEM GmbH
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Split objective lens for electron beam to enhance topographical imaging2 Jul 2026US 2026/0188603 A1
- Off-plane imaging mode for a laser phase plate2 Jul 2026US 2026/0188611 A1FEI Company
- Electron Microscope and Specimen Observation Method11 Jun 2026US 2026/0162923 A1JEOL Ltd.
- Charged Particle Beam Apparatus and Control Method for Charged Particle Beam Apparatus28 May 2026US 2026/0148924 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Objective lens with deflector plates immersed in electrostatic lens field110US 8,698,093 B1KLA-Tencor Corporation · 2014
- Electron beam writing method and system using large range deflection in combination with a continuously moving table65US 4,818,885 AInternational Business Machines Corporation · 1989
- Multi-beam charged particle system34US 10,741,355 B1Carl Zeiss MultiSEM GmbH · 2020
- Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method34US 6,392,231 B1Hermes Microvision, Inc. · 2002
- Apparatus of plural charged-particle beams33US 10,879,031 B2ASML Netherlands B. V. · 2020