H01J 2237/1035
Immersion lens
H01J2237/1035 (Immersion lens) appears on 43 US grants and 38 published applications in this corpus.
Search patents in H01J- Granted patents
- 43
- Published applications
- 38
- Assignees
- 28
- Inventors
- 101
- Latest grant
- 19 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 1 |
| 2003 | 3 | 0 |
| 2004 | 1 | 4 |
| 2005 | 5 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 1 | 1 |
| 2012 | 1 | 3 |
| 2013 | 2 | 3 |
| 2014 | 3 | 2 |
| 2015 | 1 | 0 |
| 2016 | 1 | 1 |
| 2017 | 1 | 1 |
| 2018 | 1 | 0 |
| 2019 | 0 | 1 |
| 2020 | 1 | 4 |
| 2021 | 3 | 1 |
| 2022 | 2 | 4 |
| 2023 | 2 | 2 |
| 2024 | 1 | 0 |
| 2025 | 1 | 4 |
| 2026 | 2 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Magnetic lenses, charged particle microscope systems including the same, and associated methods19 May 2026US 12,633,490 B2FEI Company
- Multiple particle beam system with a contrast correction lens system14 Apr 2026US 12,603,245 B2Carl Zeiss MultiSEM GmbH
- Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system11 Mar 2025US 12,249,478 B2Carl Zeiss MultiSEM GmbH
- Scanning electron microscope device and electron beam inspection apparatus20 Feb 2024US 11,908,658 B2Zhongke Jingyuan Electron Limited
- Charged particle beam device21 Nov 2023US 11,823,861 B2Hitachi High-Tech Corporation
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Split objective lens for electron beam to enhance topographical imaging2 Jul 2026US 2026/0188603 A1
- Electron Microscope and Specimen Observation Method11 Jun 2026US 2026/0162923 A1JEOL Ltd.
- Charged Particle Beam Apparatus and Control Method for Charged Particle Beam Apparatus28 May 2026US 2026/0148924 A1Hitachi High-Tech Corporation
- Charged particle lens12 Feb 2026US 2026/0045441 A1FEI Company
Most cited
By later US patents
- Objective lens with deflector plates immersed in electrostatic lens field110US 8,698,093 B1KLA-Tencor Corporation · 2014
- Electron beam writing method and system using large range deflection in combination with a continuously moving table65US 4,818,885 AInternational Business Machines Corporation · 1989
- Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method34US 6,392,231 B1Hermes Microvision, Inc. · 2002
- Electron beam device24US 6,037,589 ASeiko Instruments Inc. · 2000
- Magnetic lens apparatus for use in high-resolution scanning electron microscopes and lithographic processes22US 6,051,839 AArch Development Corporation · 2000