Charged particle beam device
AssigneeHitachi High-Tech Corporation
InventorsYuta Imai, Junichi Katane
Life of this patent
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Abstract
The invention provides a charged particle beam device that prevents a leakage of an unnecessary magnetic field to a trajectory of a charged particle beam with which a sample is irradiated in a sample observation according to a boosting method. The charged particle beam device includes: a charged particle source configured to generate the charged particle beam with which the sample is irradiated; an object lens configured to generate the magnetic field for focusing the charged particle beam; and a boosting electrode that is provided inside the object lens and to which a voltage for accelerating the charged particle beam is applied. The boosting electrode is formed of a magnetic material.
Claims7
A charged particle beam device including
- a charged particle source configured to generate a charged particle beam with which a sample is irradiated;
- an object lens configured to generate a magnetic field for focusing the charged particle beam;
- a boosting electrode that is provided inside the object lens and to which a voltage for accelerating the charged particle beam is applied;
- and
- an auxiliary electrode which is an electrode disposed between the boosting electrode and the charged particle source, wherein
- the boosting electrode is formed of a magnetic material,
- a voltage applied to the auxiliary electrode is lower than a voltage applied to the boosting electrode, and
- an end portion of the auxiliary electrode on a sample side is disposed closer to the sample side than is an end portion of the boosting electrode on a charged particle source side, and the end portion is disposed inside the boosting electrode.
Dependencies are inferred from the claim text.