Charged Particle Beam Apparatus and Control Method for Charged Particle Beam Apparatus

A charged particle beam apparatus comprising:

• a charged particle source configured to emit a charged particle beam with which a sample is to be irradiated;
• a focusing lens configured to focus the charged particle beam;
• an objective lens configured to form a first lens that is a magnetic field lens or an electrostatic lens and a second lens that is a magnetic field lens or an electrostatic lens, a first main surface of the first lens being disposed on the sample side with respect to a second main surface of the second lens;
• a detector disposed on the charged particle source side with respect to the second main surface of the second lens;
• and
• a controller including a processor and a memory, wherein
• the controller controls a focusing action of the second lens to be smaller than a focusing action of the first lens, causes a signal electron generated from the sample to be focused, and controls an amount of the signal electron reaching the detector.

A charged particle beam apparatus comprising:

• a charged particle source configured to emit a charged particle beam with which a sample is to be irradiated;
• a focusing lens configured to focus the charged particle beam;
• an objective lens configured to form a first lens that is a magnetic field lens or an electrostatic lens and a second lens that is a magnetic field lens or an electrostatic lens, a first main surface of the first lens being disposed on the sample side with respect to a second main surface of the second lens;
• a first detector disposed on the charged particle source side with respect to the second main surface of the second lens;
• and
• a second detector disposed on the charged particle source side with respect to the second main surface and on the sample side with respect to the first detector, and provided in the objective lens.

A method for controlling a charged particle beam apparatus, the charged particle beam apparatus including a charged particle source configured to emit a charged particle beam with which a sample is to be irradiated, a focusing lens configured to focus the charged particle beam, an objective lens configured to form a first lens that is a magnetic field lens or an electrostatic lens and a second lens that is a magnetic field lens or an electrostatic lens, a first main surface of the first lens being disposed on the sample side with respect to a second main surface of the second lens, and a detector disposed on the charged particle source side with respect to the second main surface of the second lens, the method comprising:

• emitting the charged particle beam from the charged particle source;
• forming the first lens;
• forming the second lens such that the second main surface is disposed on the charged particle source side with respect to the first main surface of the first lens;
• irradiating the sample with the charged particle beam by a focusing action of the first lens;
• and
• controlling a focusing action of the second lens to be smaller than the focusing action of the first lens, causing a signal electron generated from the sample to be focused, and controlling an amount of the signal electron reaching the detector.