Multiple particle beam system with a contrast correction lens system

A multiple particle beam system, comprising:

• a multi-beam particle source configured to generate a first field of a multiplicity of charged first individual particle beams;
• a first particle-optical unit having a first particle-optical beam path, the first particle-optical unit configured to image the first individual particle beams onto an object plane so that the first individual particle beams strike an object at incidence locations defining a second field;
• a detection system comprising a multiplicity of detection regions defining a third field;
• a second particle optical unit having a second particle optical beam path, the second particle optical unit configured to image second individual particle beams emanating from the second field onto the third field;
• a magnetic objective lens configured so that the first and the second individual particle beams pass therethrough;
• a beam switch;
• a contrast aperture having a central cutout;
• a contrast correction lens system comprising a first magnetic contrast correction lens;
• and
• a controller configured to control excitation of the contrast correction lens system,
• wherein:
• the beam switch is in the first particle optical beam path between the multi-beam particle source and the magnetic objective lens;
• the beam switch is in the second particle optical beam path between the magnetic objective lens and the detection system;
• the second individual particle beams have a cross-over in the second particle optical beam path between the beam switch and the detection system;
• the central cutout is in a region of the cross-over;
• the central cutout is configured to cut out the second individual particle beams;
• the contrast correction lens system is in the second particle optical beam path between the magnetic objective lens and the contrast aperture;
• the contrast correction lens system is configured to generate a magnetic field having an adjustable strength to correct beam tilts of the second individual particle beams in the cross-over in relation to an optical axis of the multiple particle beam system;
• the second particle optical unit comprises first and second projection lens systems;
• and
• the first magnetic contrast correction lens is arranged between the first projection lens system and the second projection lens system.