H01J 2237/0451
With fixed aperture
Official title: with fixed aperture
H01J2237/0451 (With fixed aperture) appears on 360 US grants and 420 published applications in this corpus.
Search patents in H01J- Granted patents
- 360
- Published applications
- 420
- Assignees
- 102
- Inventors
- 637
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 5 | 0 |
| 2000 | 2 | 0 |
| 2001 | 6 | 5 |
| 2002 | 7 | 4 |
| 2003 | 4 | 1 |
| 2004 | 3 | 5 |
| 2005 | 2 | 5 |
| 2006 | 2 | 4 |
| 2007 | 4 | 3 |
| 2008 | 3 | 7 |
| 2009 | 5 | 10 |
| 2010 | 7 | 10 |
| 2011 | 5 | 6 |
| 2012 | 10 | 9 |
| 2013 | 10 | 11 |
| 2014 | 8 | 6 |
| 2015 | 7 | 9 |
| 2016 | 10 | 16 |
| 2017 | 16 | 35 |
| 2018 | 23 | 18 |
| 2019 | 31 | 23 |
| 2020 | 26 | 41 |
| 2021 | 26 | 28 |
| 2022 | 24 | 40 |
| 2023 | 30 | 38 |
| 2024 | 19 | 35 |
| 2025 | 32 | 32 |
| 2026 | 22 | 19 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- E-beam exposure method and mask manufacturing method comprising the same6 Oct 2026US 12,755,931 B2Samsung Electronics Co., Ltd.
- Beam detector, multi-charged-particle-beam irradiation apparatus, and adjustment method for beam detector8 Sep 2026US 12,731,759 B2NuFlare Technology, Inc.
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Charged-particle optical device18 Aug 2026US 12,712,147 B2ASML Netherlands B. V.
- Detector substrate for use in a charged particle multi-beam assessment tool11 Aug 2026US 12,706,272 B2ASML Netherlands B. V.
- Semiconductor apparatus and method of operating the same8 Oct 2026US 2026/0310069 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Certain improvements of multi-beam generating and multi-beam deflecting units24 Sep 2026US 2026/0290743 A1Carl Zeiss MultiSEM GmbH
- Electron emission apparatus and electronic apparatus10 Sep 2026US 2026/0269164 A1Westlake University
- Multi-beam generating unit with increased focusing power30 Jul 2026US 2026/0221374 A1
- Multi-charged particle beam irradiation apparatus and multi-charged particle beam irradiation method23 Jul 2026US 2026/0213113 A1NuFlare Technology, Inc.
Most cited
By later US patents
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Pattern-definition device for maskless particle-beam exposure apparatus76US 7,084,411 B2IMS Nanofabrication GmbH · 2006
- Charged particle beamlet exposure system64US 7,084,414 B2Mapper Lithography IP B.V. · 2006
- Twin beam charged particle column and method of operating thereof61US 8,378,299 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2013
- Apparatus of plural charged-particle beams51US 9,922,799 B2Hermes Microvision, Inc. · 2018