H01J 2237/032
Mounting or supporting
H01J2237/032 (Mounting or supporting) appears on 110 US grants and 129 published applications in this corpus.
Search patents in H01J- Granted patents
- 110
- Published applications
- 129
- Assignees
- 72
- Inventors
- 357
- Latest grant
- 21 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 1 | 4 |
| 2009 | 1 | 6 |
| 2010 | 3 | 5 |
| 2011 | 3 | 0 |
| 2012 | 4 | 5 |
| 2013 | 3 | 7 |
| 2014 | 4 | 5 |
| 2015 | 11 | 16 |
| 2016 | 10 | 7 |
| 2017 | 9 | 9 |
| 2018 | 11 | 4 |
| 2019 | 8 | 4 |
| 2020 | 3 | 7 |
| 2021 | 5 | 5 |
| 2022 | 6 | 6 |
| 2023 | 10 | 10 |
| 2024 | 5 | 13 |
| 2025 | 8 | 9 |
| 2026 | 3 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Orientation tool for electron backscatter diffraction21 Apr 2026US 12,609,275 B2GM Global Technology Operations LLC
- Electrode fixing assembly and dry etching device24 Mar 2026US 12,586,766 B2Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Extraction grid24 Feb 2026US 12,562,331 B2BüHler Alzenau GmbH
- AFE (active far edge) heater/bipolar ESC with simplified and optimized structure for greater reliability, lower cost and better manufacturability18 Nov 2025US 12,476,092 B2APPLIED Materials.Inc.
- Lattice based voltage standoff11 Nov 2025US 12,469,666 B2APPLIED Materials.Inc.
- Processing system for generating ion beams having tunable angle8 Oct 2026US 2026/0311953 A1APPLIED Materials.Inc.
- Semiconductor manufacturing apparatus including reflector2 Jul 2026US 2026/0188604 A1Samsung Electronics Co., Ltd.
- Ion implantation device18 Jun 2026US 2026/0171344 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Focused ion beam systems including multipole elements and deceleration elements11 Jun 2026US 2026/0162925 A1FEI Company
- Plasma head and plasma generation device11 Jun 2026US 2026/0162934 A1Fuji Corporation
Most cited
By later US patents
- Electrostatic lens array44US 8,748,842 B2Canon Kabushiki Kaisha · 2014
- Electrode of electrostatic lens and method of manufacturing the same32US 8,963,099 B2Canon Kabushiki Kaisha · 2015
- Inspection device27US 8,497,476 B2Ebara Corporation · 2013
- X-ray generation device having multiple metal target members12US 10,115,557 B2Hamamatsu Photonics K.K. · 2018
- Anchoring inserts, electrode assemblies, and plasma processing chambers9US 8,187,414 B2Lam Research Corporation · 2012