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US 12,476,092 B2Granted
AFE (active far edge) heater/bipolar ESC with simplified and optimized structure for greater reliability, lower cost and better manufacturability
AssigneeApplied Materials, Inc.
InventorsJuan Carlos Rocha-Alvarez, Jian Li
Life of this patent
Estimating the term…
Abstract
A method and apparatus for a substrate support, comprising a ceramic body, at least one heater, at least one chucking electrode, and a unitary plasma support structure comprising an electrical connection portion, at least one electrical distribution portion, and annular electrode connected to the electrical connection portion by the at least one electrical distribution portion, the electrical connection portion, at least one electrical distribution portion, and annular electrode configured of a unitary sheet of a conductive fiber mesh.
Claims14
A substrate support, comprising:
- a ceramic body,
- at least one heater,
- at least one chucking electrode, and
- a unitary plasma support structure comprising an electrical connection portion, at least one electrical distribution portion, and an annular electrode connected to the electrical connection portion by the at least one electrical distribution portion, the electrical connection portion, at least one electrical distribution portion, and the annular electrode connected to the electrical connection portion extending within the ceramic body in a plane
- the unitary plasma support structure further comprising a conductive plug disposed within the ceramic body, an opening inwardly of the electrostatic chuck to the conductive plug and a distal end of one wire of a plurality of conductive wires is received in the conductive plug within the ceramic body.
2 more elements
A substrate support, comprising:
- a ceramic body,
- at least one heater,
- at least one chucking electrode, and
- a unitary plasma support structure comprising an electrical connection portion, at least one electrical distribution portion, and annular electrode connected to the electrical connection portion by the at least one electrical distribution portion, the electrical connection portion, at least one electrical distribution portion, and annular electrode configured of a unitary sheet of a conductive fiber mesh
- the unitary plasma support structure further comprising a conductive plug, wherein a distal end of one wire of a plurality of conductive wires is received in the conductive plug.
2 more elements
Dependencies are inferred from the claim text.