G03F 7/70875
Temperature
Official title: {Temperature, e.g. temperature control of masks or workpieces via control of stage temperature}
G03F7/70875 (Temperature) appears on 651 US grants and 666 published applications in this corpus.
Search patents in G03F- Granted patents
- 651
- Published applications
- 666
- Assignees
- 114
- Inventors
- 1,351
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 6 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 4 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 6 | 0 |
| 1992 | 7 | 0 |
| 1993 | 8 | 0 |
| 1994 | 3 | 0 |
| 1995 | 5 | 0 |
| 1996 | 5 | 0 |
| 1997 | 6 | 0 |
| 1998 | 10 | 0 |
| 1999 | 16 | 0 |
| 2000 | 8 | 0 |
| 2001 | 9 | 11 |
| 2002 | 14 | 16 |
| 2003 | 12 | 6 |
| 2004 | 16 | 24 |
| 2005 | 12 | 40 |
| 2006 | 23 | 35 |
| 2007 | 19 | 39 |
| 2008 | 23 | 27 |
| 2009 | 15 | 17 |
| 2010 | 16 | 20 |
| 2011 | 9 | 19 |
| 2012 | 19 | 22 |
| 2013 | 18 | 19 |
| 2014 | 29 | 20 |
| 2015 | 16 | 25 |
| 2016 | 32 | 20 |
| 2017 | 35 | 34 |
| 2018 | 30 | 39 |
| 2019 | 48 | 29 |
| 2020 | 28 | 26 |
| 2021 | 19 | 18 |
| 2022 | 24 | 33 |
| 2023 | 21 | 24 |
| 2024 | 22 | 52 |
| 2025 | 21 | 26 |
| 2026 | 25 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Imprinting apparatus15 Sep 2026US 12,736,872 B2Koninklijke Philips N. V.
- Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method15 Sep 2026US 12,736,887 B2ASML Netherlands B. V.
- Substrate processing apparatus for processing a substrate in one process chamber8 Sep 2026US 12,730,387 B2Samsung Electronics Co., Ltd.
- Method of operating semiconductor apparatus25 Aug 2026US 12,717,242 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Split double sided wafer and reticle clamps25 Aug 2026US 12,717,249 B2ASML Holding N. V.
- Method and system for temperature controlling in lithography process10 Sep 2026US 2026/0267240 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Euv radiation energy sensor10 Sep 2026US 2026/0267241 A1ASML Netherlands B. V.
- Silencer and lithographic apparatus thermal conditioning system27 Aug 2026US 2026/0251255 A1ASML Netherlands B. V.
- Spatial light modulation unit and exposure apparatus27 Aug 2026US 2026/0251981 A1Nikon Corporation
- Controlled Environment Photoresist Processing System and Method20 Aug 2026US 2026/0244113 A1
Most cited
By later US patents
- Photolithographic method for the manufacture of integrated circuits1,126US 4,346,164 A1982
- Immersion type projection exposure apparatus1,116US 5,610,683 ACanon Kabushiki Kaisha · 1997
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Apparatus for the photolithographic manufacture of integrated circuit elements958US 4,509,852 A1985
- Method for optical inspection and lithography624US 5,900,354 A1999