G03F 7/0758
With silicon- containing groups in the side chains
Official title: {with silicon- containing groups in the side chains}
G03F7/0758 (With silicon- containing groups in the side chains) appears on 360 US grants and 334 published applications in this corpus.
Search patents in G03F- Granted patents
- 360
- Published applications
- 334
- Assignees
- 132
- Inventors
- 726
- Latest grant
- 11 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 6 | 0 |
| 1989 | 6 | 0 |
| 1990 | 2 | 0 |
| 1991 | 6 | 0 |
| 1992 | 5 | 0 |
| 1993 | 9 | 0 |
| 1994 | 6 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 5 | 0 |
| 2000 | 11 | 0 |
| 2001 | 9 | 6 |
| 2002 | 13 | 26 |
| 2003 | 15 | 23 |
| 2004 | 19 | 21 |
| 2005 | 15 | 14 |
| 2006 | 13 | 11 |
| 2007 | 11 | 10 |
| 2008 | 9 | 14 |
| 2009 | 10 | 18 |
| 2010 | 8 | 10 |
| 2011 | 10 | 15 |
| 2012 | 6 | 13 |
| 2013 | 10 | 17 |
| 2014 | 18 | 9 |
| 2015 | 19 | 17 |
| 2016 | 15 | 10 |
| 2017 | 12 | 9 |
| 2018 | 8 | 23 |
| 2019 | 8 | 14 |
| 2020 | 16 | 8 |
| 2021 | 8 | 12 |
| 2022 | 4 | 12 |
| 2023 | 10 | 4 |
| 2024 | 8 | 10 |
| 2025 | 7 | 4 |
| 2026 | 1 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for preparing pixel define layer11 Aug 2026US 12,704,783 B2Duk San Neolux Co., Ltd.
- Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device23 Sep 2025US 12,422,750 B2FUJIFILM Corporation
- Highly sequenced copolymer for dual-tone photoresists, resist composition and patterning process thereof5 Aug 2025US 12,379,657 B2Canton Litho Material Technology Inc.
- Pattern forming method, kit, and resist composition29 Jul 2025US 12,372,868 B2FUJIFILM Corporation
- Treatment liquid and pattern forming method20 May 2025US 12,306,538 B2FUJIFILM Corporation
- Silicone-containing copolymer, leveling agent, coating composition, resist composition, color filter, and method for producing silicone-containing copolymer10 Sep 2026US 2026/0265437 A1DIC Corporation
- Multilayer-structure-type photosensitive dry film, patterning process, display, and micro-led display11 Jun 2026US 2026/0161083 A1Shin-Etsu Chemical Co., Ltd.
- Random copolymer, coating composition and resist composition containing said copolymer4 Jun 2026US 2026/0152592 A1DIC Corporation
- Silicone-containing copolymer, leveling agent, coating composition, resist composition, color filter, and silicone-containing copolymer production method15 Jan 2026US 2026/0016621 A1DIC Corporation
- Patterning process and resist material2 Oct 2025US 2025/0306462 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist471US 6,811,960 B2Hyundai Electronics Industries Co., Ltd. · 2004
- Photoresist polymer and photoresist composition containing the same471US 7,279,256 B2Hynix Semiconductor Inc. · 2007
- Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording113US 7,323,275 B2Dai Nippon Printing Co.Ltd. · 2008
- Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording104US 7,629,086 B2Dai Nippon Printing Co.Ltd. · 2009