G03F 7/0397
The macromolecular compound having an alicyclic moiety in a side chain
Official title: {the macromolecular compound having an alicyclic moiety in a side chain}
G03F7/0397 (The macromolecular compound having an alicyclic moiety in a side chain) appears on 2,469 US grants and 3,581 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,469
- Published applications
- 3,581
- Assignees
- 215
- Inventors
- 1,984
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 11 | 8 |
| 2002 | 33 | 78 |
| 2003 | 47 | 116 |
| 2004 | 80 | 80 |
| 2005 | 56 | 109 |
| 2006 | 66 | 108 |
| 2007 | 79 | 95 |
| 2008 | 67 | 119 |
| 2009 | 92 | 176 |
| 2010 | 101 | 186 |
| 2011 | 124 | 161 |
| 2012 | 117 | 236 |
| 2013 | 148 | 202 |
| 2014 | 208 | 160 |
| 2015 | 217 | 157 |
| 2016 | 169 | 188 |
| 2017 | 142 | 122 |
| 2018 | 113 | 100 |
| 2019 | 87 | 111 |
| 2020 | 62 | 120 |
| 2021 | 66 | 135 |
| 2022 | 71 | 121 |
| 2023 | 113 | 176 |
| 2024 | 73 | 167 |
| 2025 | 74 | 186 |
| 2026 | 50 | 164 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Resist composition and method for using resist composition8 Sep 2026US 12,730,375 B2Mitsubishi Gas Chemical Company, Inc.
- Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device1 Sep 2026US 12,724,344 B2FUJIFILM Corporation
- Salt, acid generator, resist composition and method for producing resist pattern25 Aug 2026US 12,715,843 B2Sumitomo Chemical Company, Limited
- Method for evaluating resist polymer25 Aug 2026US 12,716,841 B2Maruzen Petrochemical Co., Ltd.
- Photoactive compounds, photoresist compositions including the same, and pattern formation methods25 Aug 2026US 12,717,231 B2Dupont Electronic Materials International, LLC
- Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming process8 Oct 2026US 2026/0310075 A1Shin-Etsu Chemical Co., Ltd.
- Resist composition, resist pattern formation method, compound and polymer compound1 Oct 2026US 2026/0299419 A1Tokyo Ohka Kogyo.Co., Ltd.
- Salt, acid generator, resin, resist composition, and method for producing resist pattern24 Sep 2026US 2026/0288002 A1Sumitomo Chemical Company, Limited
- Resist composition and method for forming resist pattern10 Sep 2026US 2026/0267225 A1Tokyo Ohka Kogyo.Co., Ltd.
- Preparation of polymer, preparation of chemically amplified resist composition, resist pattern forming process, polymer, and chemically amplified resist composition3 Sep 2026US 2026/0259497 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Photodecomposable bases and photoresist compositions470US 8,614,047 B2International Business Machines Corporation · 2013
- Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion469US 6,924,078 B2Dongjin Semichem Co., Ltd. · 2005
- Polymer, resist composition, and patterning process146US 7,537,880 B2Shin-Etsu Chemical Co., Ltd. · 2009
- Lactone-containing compounds, polymers, resist compositions, and patterning method118US 6,280,898 B1Shin-Etsu Chemical Co., Ltd. · 2001
- Positive resist composition and method of forming resist pattern from the same95US 7,074,543 B2Tokyo Ohka Kogyo.Co., Ltd. · 2006