Resist composition and method for forming resist pattern

A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:

• a resin component (A1) whose solubility in a developing solution is changed by the action of the acid;
• and
• a compound (D0) which contains a group represented by General Formula (d0-r),
• wherein the resin component (A1) has a constitutional unit (a01) represented by General Formula (a0-1) and a constitutional unit (a10) represented by General Formula (a10-1),
• wherein Rx01 represents a hydrogen atom, an alkyl group, or an alkoxy group, Rx021 to Rx028 each independently represents a hydrogen atom or an alkyl group, nd represents 0 or 1, and * represents a bonding site,
• wherein R0 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va0 represents a single bond or a divalent linking group, and Ra0 represents an acid dissociable group represented by General Formula (a01-r-1),
• wherein Ra01 to Ra03 each independently represent a hydrocarbon group which may have a substituent, where Ra02 and Ra03 may be bonded to each other to form a ring, and * represents a bonding site,
• wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Yax1 represents a single bond or a divalent linking group, Wax1 represents an aromatic hydrocarbon group which may have a substituent, and nax1 represents an integer of 1 or greater.