G03F 7/0295
Photolytic halogen compounds
Official title: {Photolytic halogen compounds}
G03F7/0295 (Photolytic halogen compounds) appears on 141 US grants and 81 published applications in this corpus.
Search patents in G03F- Granted patents
- 141
- Published applications
- 81
- Assignees
- 59
- Inventors
- 341
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 7 | 0 |
| 1977 | 4 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 5 | 0 |
| 1981 | 3 | 0 |
| 1982 | 3 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 4 | 0 |
| 1990 | 6 | 0 |
| 1991 | 13 | 0 |
| 1992 | 4 | 0 |
| 1993 | 10 | 0 |
| 1994 | 4 | 0 |
| 1995 | 5 | 0 |
| 1996 | 7 | 0 |
| 1997 | 4 | 0 |
| 1998 | 4 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 2 | 0 |
| 2002 | 1 | 1 |
| 2003 | 0 | 1 |
| 2004 | 3 | 12 |
| 2005 | 0 | 6 |
| 2006 | 6 | 1 |
| 2007 | 8 | 7 |
| 2008 | 1 | 4 |
| 2009 | 2 | 4 |
| 2010 | 2 | 1 |
| 2011 | 0 | 1 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 1 | 1 |
| 2015 | 2 | 0 |
| 2016 | 0 | 1 |
| 2017 | 0 | 2 |
| 2018 | 1 | 3 |
| 2019 | 0 | 3 |
| 2020 | 2 | 5 |
| 2021 | 2 | 2 |
| 2022 | 2 | 5 |
| 2023 | 2 | 9 |
| 2024 | 3 | 2 |
| 2025 | 1 | 5 |
| 2026 | 2 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same15 Sep 2026US 12,736,876 B2LG Chem.Ltd.
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board25 Aug 2026US 12,717,233 B2Resonac Corporation
- Lithographic printing plate precursor and method of use11 Feb 2025US 12,222,645 B2Eastman Kodak Company
- Diaroyl carbazole compound and use thereof as sensitising agent24 Dec 2024US 12,172,962 B2Igm (Anqing) High Technology Development Co., Ltd
- Low temperature cure photoimageable dielectric compositions and methods of their use21 May 2024US 11,988,963 B2
- Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board3 Sep 2026US 2026/0259500 A1
- Photosensitive element, resist pattern formation method, and printed wiring board manufacturing method3 Sep 2026US 2026/0259501 A1Resonac Corporation
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing circuit board27 Aug 2026US 2026/0251971 A1
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing semiconductor package or printed wiring board2 Jul 2026US 2026/0186413 A1
- Iodonium salt, chemically amplified positive resist composition and resist pattern forming process26 Feb 2026US 2026/0056469 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine226US 4,330,590 AMinnesota Mining and Manufacturing Company · 1982
- Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromophore-substituted halomethyl-2-triazine197US 4,329,384 AMinnesota Mining and Manufacturing Company · 1982
- Photopolymerizable composition119US 4,239,850 AFuji Photo Film Co., Ltd. · 1980
- Radiation-sensitive copying composition118US 4,189,323 AHoechst Aktiengesellschaft · 1980
- Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines112US 3,954,475 AMinnesota Mining and Manufacturing Company · 1976