G03F 7/029
Inorganic compounds
Official title: Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
G03F7/029 (Inorganic compounds) appears on 924 US grants and 816 published applications in this corpus.
Search patents in G03F- Granted patents
- 924
- Published applications
- 816
- Assignees
- 307
- Inventors
- 2,021
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 11 | 0 |
| 1977 | 6 | 0 |
| 1978 | 8 | 0 |
| 1979 | 9 | 0 |
| 1980 | 14 | 0 |
| 1981 | 21 | 0 |
| 1982 | 6 | 0 |
| 1983 | 6 | 0 |
| 1984 | 6 | 0 |
| 1985 | 8 | 0 |
| 1986 | 7 | 0 |
| 1987 | 11 | 0 |
| 1988 | 9 | 0 |
| 1989 | 17 | 0 |
| 1990 | 25 | 0 |
| 1991 | 31 | 0 |
| 1992 | 23 | 0 |
| 1993 | 26 | 0 |
| 1994 | 21 | 0 |
| 1995 | 21 | 0 |
| 1996 | 22 | 0 |
| 1997 | 21 | 0 |
| 1998 | 26 | 0 |
| 1999 | 21 | 0 |
| 2000 | 35 | 0 |
| 2001 | 15 | 4 |
| 2002 | 17 | 18 |
| 2003 | 11 | 24 |
| 2004 | 23 | 29 |
| 2005 | 13 | 41 |
| 2006 | 19 | 27 |
| 2007 | 27 | 33 |
| 2008 | 19 | 23 |
| 2009 | 19 | 24 |
| 2010 | 14 | 16 |
| 2011 | 7 | 15 |
| 2012 | 8 | 20 |
| 2013 | 14 | 27 |
| 2014 | 34 | 26 |
| 2015 | 19 | 24 |
| 2016 | 9 | 29 |
| 2017 | 22 | 38 |
| 2018 | 17 | 50 |
| 2019 | 36 | 28 |
| 2020 | 32 | 47 |
| 2021 | 18 | 39 |
| 2022 | 21 | 43 |
| 2023 | 17 | 68 |
| 2024 | 32 | 50 |
| 2025 | 30 | 40 |
| 2026 | 20 | 33 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Photosensitive composition for forming light blocking layer of organic light emitting device6 Oct 2026US 12,754,477 B2Duk San Neolux Co., Ltd.
- Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same15 Sep 2026US 12,736,876 B2LG Chem.Ltd.
- Methods of forming an object in a volume of a photohardenable composition, photohardenable compositions, and photoinitiators25 Aug 2026US 12,715,998 B2Quadratic 3D, Inc.
- Casting lacquer for screen printing25 Aug 2026US 12,716,002 B2BASF SE
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board25 Aug 2026US 12,717,233 B2Resonac Corporation
- Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board3 Sep 2026US 2026/0259500 A1
- Photosensitive element, resist pattern formation method, and printed wiring board manufacturing method3 Sep 2026US 2026/0259501 A1Resonac Corporation
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing circuit board27 Aug 2026US 2026/0251971 A1
- Photosensitive resin composition, photosensitive resin film, multilayer printed wiring board, semiconductor package, and method for manufacturing multilayer printed wiring board27 Aug 2026US 2026/0251972 A1Resonac Corporation
- Photosensitive composition, transfer film, method for manufacturing laminate, laminate, and semiconductor package27 Aug 2026US 2026/0256003 A1FUJIFILM Corporation
Most cited
By later US patents
- Process for the sensitization of an oxidation/reduction photocatalyst, and photocatalyst thus obtained420US 4,684,537 AR. E. Stiftung · 1987
- Ternary photoinitiator system for addition polymerization289US 5,545,676 AMinnesota Mining and Manufacturing Company · 1996
- Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-2-triazine226US 4,330,590 AMinnesota Mining and Manufacturing Company · 1982
- Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems219US 4,250,053 AMinnesota Mining and Manufacturing Company · 1981
- Photocurable compositions containing group via aromatic onium salts198US 4,058,401 AGeneral Electric Company · 1977