G03F 7/0236
Condensation products of carbonyl compounds and phenolic compounds
Official title: {Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins}
G03F7/0236 (Condensation products of carbonyl compounds and phenolic compounds) appears on 310 US grants and 181 published applications in this corpus.
Search patents in G03F- Granted patents
- 310
- Published applications
- 181
- Assignees
- 113
- Inventors
- 598
- Latest grant
- 12 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 2 | 0 |
| 1987 | 4 | 0 |
| 1988 | 5 | 0 |
| 1989 | 8 | 0 |
| 1990 | 6 | 0 |
| 1991 | 10 | 0 |
| 1992 | 6 | 0 |
| 1993 | 15 | 0 |
| 1994 | 17 | 0 |
| 1995 | 19 | 0 |
| 1996 | 7 | 0 |
| 1997 | 21 | 0 |
| 1998 | 17 | 0 |
| 1999 | 11 | 0 |
| 2000 | 11 | 0 |
| 2001 | 5 | 2 |
| 2002 | 8 | 5 |
| 2003 | 6 | 8 |
| 2004 | 8 | 6 |
| 2005 | 4 | 5 |
| 2006 | 3 | 7 |
| 2007 | 4 | 5 |
| 2008 | 4 | 4 |
| 2009 | 2 | 5 |
| 2010 | 1 | 5 |
| 2011 | 2 | 10 |
| 2012 | 2 | 10 |
| 2013 | 6 | 9 |
| 2014 | 10 | 13 |
| 2015 | 8 | 10 |
| 2016 | 6 | 3 |
| 2017 | 9 | 8 |
| 2018 | 4 | 8 |
| 2019 | 4 | 13 |
| 2020 | 5 | 10 |
| 2021 | 6 | 10 |
| 2022 | 5 | 10 |
| 2023 | 12 | 7 |
| 2024 | 2 | 2 |
| 2025 | 9 | 4 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms12 May 2026US 12,625,428 B2Nissan Chemical Corporation
- Photosensitive resin composition, method for producing patterned cured film, patterned cured film and semiconductor element10 Feb 2026US 12,547,074 B2Resonac Corporation
- Functional photoresist and method of patterning nanoparticle thin film using the same6 Jan 2026US 12,517,428 B2Korea University Research and Business Foundation
- Novolak resin, epoxy resin, photosensitive resin composition, curable resin composition, cured substance, electronic device, production method for novolak resin, and production method for epoxy resin23 Dec 2025US 12,503,587 B2Central Glass Company, Limited
- Photosensitive resin composition, method for selecting photosensitive resin composition, method for producing patterned cured film, and method for producing semiconductor device2 Sep 2025US 12,405,198 B2Resonac Corporation
- Photosensitive resin composition, insulating film, and display device comprising same4 Jun 2026US 2026/0153805 A1Dongjin Semichem Co., Ltd.
- Material for forming superfine pattern, photosensitive resin composition, pattern treatment composition and formation method of superfine pattern19 Feb 2026US 2026/0050215 A1Advanced Echem Materials Company Limited
- Lithography apparatus, patterning system, and method of patterning a layered structure20 Nov 2025US 2025/0355345 A1APPLIED Materials.Inc.
- Chemical-resistant protective film30 Oct 2025US 2025/0333565 A1Nissan Chemical Corporation
- Compositions and methods of improving metal structure fabrication by wet chemical etch31 Jul 2025US 2025/0244669 A1Merck Patent GmbH
Most cited
By later US patents
- Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide64US 4,308,368 ADaicel Chemical Industries, Ltd. · 1981
- Positive novolak photoresist compositions64US 4,377,631 APhilip A. Hunt Chemical Corporation · 1983
- Positive photoresist composition with cresol-formaldehyde novolak resins54US 4,529,682 APhilip A. Hunt Chemical Corporation · 1985
- Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide45US 4,551,409 AShipley Company, L.L.C. · 1985
- Novolak photoresist composition and preparation thereof42US 4,173,470 ABell Telephone Laboratories, Incorporated · 1979