Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
AssigneeDaicel Chemical Industries, Ltd.
InventorsKeiji Kubo, Tetsuo Ishihara
Life of this patent
Estimating the term…
Abstract
Photosensitive compositions which contain as a photosensitive resin prepared by the condensation of the co-condensated novolak resin of the mixture of phenols such as in a combination of tert-butyl (or tert-octyl) phenol and phenol and/or cresol and formaldehyde, with o-quinonediazido sulfonic (or carboxylic) acid or contain said novolak resin as an additive for a photosensitive o-quinonediazido compound are discosed.
Claims15
A photosensitive composition which comprises a photosensitive resin as an active component which is prepared by condensating an alkali-soluble co-condensated novolak resin prepared by the condensation of a mixture of a mole ratio of 1:9-9:1 of at least one compound represented by the formula (I):
- ##STR4## wherein R is an alkyl group having 3 to 12 carbon atoms or phenyl group, at least one of phenol and a methyl-substituted derivative thereof, and formaldehyde in 50-100 mole % relative to said phenol mixture, with a o-quinonediazido compound represented the formula (II) or (III):
- ##STR5## wherein X is --SO.sub.2 Y or --COY group in which Y is a removable group, in an amount of 20 to 100 mole % based on the hydroxy groups in the novolak resin.
A photosensitive composition which comprises a photosensitive o-quinonediazido compound and at least one alkali-soluble co-condensated novolak resin prepared by the condensation of a mixture of a mole ratio of 1:9-9:1 of at least one compound represented by the formula (I):
- ##STR6## wherein R is an alkyl group having 3-12 carbon atoms or phenyl group, and at least one of phenol and a methyl-substituted derivative thereof, and formaldehyde in 50-100 mole % to said phenol mixture.
Dependencies are inferred from the claim text.