Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
AssigneeShipley Company, L.L.C.
InventorsMichael Gulla, Paul Taylor, Michael J. Oddi
Life of this patent
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Abstract
A photoresist composition comprising a sensitizer in a binder that is a naphthol polymer alone or mixed with another compatible resin such as a novolak resin or a polyvinyl phenol. The use of the naphthol resin as a portion of the binder increases the heat distortion temperature of the photoresist composition.
Claims22
A photoresist composition comprising an admixture of a binder and a sensitizer, said binder being an alkali soluble naphthol polymer that is the product of condensation of an aldehyde and a mixed monomer consisting of a naphthol and a phenol, the binder having a naphthol content of at least 1 mole percent, and said sensitizer comprising a binder compatible and developable sensitizer selected from the group of positive working o-quinone diazide compounds and negative working azide compounds, said sensitizer being present in an amount of from 0.1 to 50 weight percent of the photoresist composition.
A photoresist composition comprising an admixture of a binder and a sensitizer, said binder being an alkali soluble admixture of an alkali soluble naphthol polymer and an alkali soluble polymer, said naphthol polymer consisting of the condensation product of an aldehyde and naphthol in combination with a phenol, said alkali soluble polymer being selected from the group of novolak resins and polyvinyl phenols, said binder having a naphthol content of at least 1 mole percent, and said sensitizer being a binder compatible and developable sensitizer selected from the group of positive working o-quinone diazide compounds and negative working azide compounds, said sensitizer being present in an amount of from 0.1 to 50 weight percent of the photoresist composition.
Dependencies are inferred from the claim text.