G03F 7/022
Quinonediazides
Official title: Quinonediazides (G03F7/075 takes precedence)
G03F7/022 (Quinonediazides) appears on 1,434 US grants and 852 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,434
- Published applications
- 852
- Assignees
- 287
- Inventors
- 2,198
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 8 | 0 |
| 1978 | 9 | 0 |
| 1979 | 9 | 0 |
| 1980 | 7 | 0 |
| 1981 | 21 | 0 |
| 1982 | 10 | 0 |
| 1983 | 10 | 0 |
| 1984 | 12 | 0 |
| 1985 | 18 | 0 |
| 1986 | 16 | 0 |
| 1987 | 17 | 0 |
| 1988 | 19 | 0 |
| 1989 | 42 | 0 |
| 1990 | 35 | 0 |
| 1991 | 38 | 0 |
| 1992 | 45 | 0 |
| 1993 | 68 | 0 |
| 1994 | 82 | 0 |
| 1995 | 54 | 0 |
| 1996 | 44 | 0 |
| 1997 | 55 | 0 |
| 1998 | 51 | 0 |
| 1999 | 40 | 0 |
| 2000 | 38 | 0 |
| 2001 | 40 | 15 |
| 2002 | 35 | 28 |
| 2003 | 36 | 41 |
| 2004 | 37 | 50 |
| 2005 | 25 | 30 |
| 2006 | 26 | 34 |
| 2007 | 18 | 31 |
| 2008 | 24 | 22 |
| 2009 | 17 | 37 |
| 2010 | 21 | 41 |
| 2011 | 15 | 44 |
| 2012 | 32 | 40 |
| 2013 | 32 | 33 |
| 2014 | 43 | 46 |
| 2015 | 33 | 39 |
| 2016 | 36 | 16 |
| 2017 | 22 | 29 |
| 2018 | 22 | 51 |
| 2019 | 25 | 46 |
| 2020 | 25 | 41 |
| 2021 | 26 | 31 |
| 2022 | 23 | 33 |
| 2023 | 29 | 19 |
| 2024 | 15 | 22 |
| 2025 | 14 | 21 |
| 2026 | 9 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Photosensitive resin composition and manufacturing method of display device using the same14 Jul 2026US 12,681,385 B2Ltc Co., Ltd.
- Positive photosensitive resin composition for low-temperature process and method for preparing photoresist film19 May 2026US 12,631,965 B2eChem Solutions Corp.
- Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms12 May 2026US 12,625,428 B2Nissan Chemical Corporation
- Positive photosensitive resin composition5 May 2026US 12,619,144 B2Dongjin Semichem Co., Ltd.
- Photosensitive resin composition and method for producing cured relief pattern28 Apr 2026US 12,613,465 B2Asahi Kasei Kabushiki Kaisha
- Photosensitive resin composition, resin film having pattern, method for producing resin film having pattern, and semiconductor circuit board1 Oct 2026US 2026/0299411 A1Jsr Corporation
- Photosensitive resin composition, cured substance, laminate, manufacturing method for cured substance, manufacturing method for laminate, manufacturing method for semiconductor device, and semiconductor device27 Aug 2026US 2026/0251975 A9FUJIFILM Corporation
- Negative photosensitive resin composition, dry film, cured product, and electronic component13 Aug 2026US 2026/0235951 A1Taiyo Holdings Co., Ltd.
- Photosensitive resin composition, photosensitive resin coating film, photosensitive dry film, and pattern formation method6 Aug 2026US 2026/0227693 A1Shin-Etsu Chemical Co., Ltd.
- Photosensitive resin composition, resin film having pattern and method for producing same, and semiconductor circuit board16 Jul 2026US 2026/0202742 A1Jsr Corporation
Most cited
By later US patents
- One component EUV photoresist477US 7,005,227 B2Intel Corporation · 2006
- Light-sensitive composition and light-sensitive lithographic printing plate containing o-quinonediazide compound, novolak resin, polymer and enclosure compound134US 5,723,253 AKonica Corporation · 1998
- Hydroxy polyimides and high temperature positive photoresists therefrom123US 4,927,736 AHoechst Celanese Corporation · 1990
- Photoresist pattern fabrication employing chemically amplified metalized material86US 4,921,778 AShipley Company, L.L.C. · 1990
- Water-soluble photopolymer and method of forming pattern by use of the same85US 4,745,042 AMatsushita Electric Industrial Co., Ltd. · 1988