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US 12,517,428 B2Granted
Functional photoresist and method of patterning nanoparticle thin film using the same
AssigneeKorea University Research and Business Foundation
InventorsSoong Ju Oh, Jun Hyuk Ahn, Jung Ho Bae
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Abstract
The functional photoresist for patterning a nanoparticle thin film including nanoparticles on a substate includes: a photoactive compound (PAC); and a functional ligand that is bound to surfaces of the nanoparticles and controls physical properties of the nanoparticles.
Claims11
A functional photoresist for patterning a nanoparticle thin film comprising nanoparticles on a substate, comprising:
- a photoactive compound;
- and
- a functional ligand that is bound to surfaces of the nanoparticles and controls physical properties of the nanoparticles,
- wherein the functional ligand has a concentration of 100 mM to 500 mM.
1 more element
Dependencies are inferred from the claim text.