G03F 7/012
Macromolecular azides
Official title: Macromolecular azides; Macromolecular additives, e.g. binders {(G03F7/0085 takes precedence)}
G03F7/012 (Macromolecular azides) appears on 119 US grants and 41 published applications in this corpus.
Search patents in G03F- Granted patents
- 119
- Published applications
- 41
- Assignees
- 78
- Inventors
- 292
- Latest grant
- 2 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 4 | 0 |
| 1979 | 1 | 0 |
| 1980 | 2 | 0 |
| 1981 | 2 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 2 | 0 |
| 1986 | 6 | 0 |
| 1987 | 1 | 0 |
| 1988 | 5 | 0 |
| 1989 | 7 | 0 |
| 1990 | 6 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 6 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 10 | 0 |
| 1999 | 6 | 0 |
| 2000 | 5 | 0 |
| 2001 | 4 | 3 |
| 2002 | 3 | 2 |
| 2003 | 2 | 1 |
| 2004 | 1 | 4 |
| 2005 | 3 | 1 |
| 2006 | 1 | 2 |
| 2007 | 1 | 1 |
| 2008 | 1 | 0 |
| 2009 | 1 | 2 |
| 2010 | 1 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 1 | 0 |
| 2014 | 0 | 0 |
| 2015 | 2 | 2 |
| 2016 | 0 | 1 |
| 2017 | 1 | 1 |
| 2018 | 1 | 4 |
| 2019 | 1 | 4 |
| 2020 | 1 | 3 |
| 2021 | 4 | 2 |
| 2022 | 2 | 1 |
| 2023 | 0 | 1 |
| 2024 | 1 | 2 |
| 2025 | 3 | 1 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same2 Dec 2025US 12,487,521 B2Lawrence Livermore National Security, LLC
- Pattern forming method, resist material, and pattern forming apparatus21 Oct 2025US 12,449,737 B2Oji Holdings Corporation
- Photoresist composition and method of forming photoresist pattern11 Feb 2025US 12,222,647 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist composition and method of forming photoresist pattern30 Apr 2024US 11,971,659 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist material, method of fabcricating same, and color filter substrate22 Nov 2022US 11,506,975 B2Tcl China Star Optoelectronics Technology Co., Ltd.
- Semiconductor photoresist composition and method of forming patterns using the composition15 Jan 2026US 2026/0016748 A1Samsung Electronics Co., Ltd.
- Photoresist composition and method of forming photoresist pattern22 May 2025US 2025/0164881 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Polyimides having low dielectric loss23 May 2024US 2024/0166818 A1Solvay Specialty Polymers Italy S.P.A.
- Polyimides having low dielectric loss9 May 2024US 2024/0150524 A1Solvay Specialty Polymers Italy S.P.A.
- Photoresist composition and method of forming photoresist pattern26 Jan 2023US 2023/0028673 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Molecularly imprinted materials, method for their preparation and devices employing such materials249US 5,587,273 AAdvanced Microbotics Corporation · 1996
- 3- and 4-Azidophthalic acid derivatives78US 4,250,096 ACiba-Geigy Corporation · 1981
- Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent77US 5,212,043 ATosho, Inc. · 1993
- Photosensitive material71US 4,424,325 ADaikin Kogyo Co., Ltd. · 1984
- Photosensitive compositions and a method of patterning using the same68US 4,740,451 ATokyo Ohka Kogyo.Co., Ltd. · 1988