G03F 7/0125
Characterised by the polymeric binder or the macromolecular additives other than the
Official title: {characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides}
G03F7/0125 (Characterised by the polymeric binder or the macromolecular additives other than the) appears on 79 US grants and 22 published applications in this corpus.
Search patents in G03F- Granted patents
- 79
- Published applications
- 22
- Assignees
- 51
- Inventors
- 199
- Latest grant
- 21 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 3 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 2 | 0 |
| 1986 | 6 | 0 |
| 1987 | 1 | 0 |
| 1988 | 4 | 0 |
| 1989 | 5 | 0 |
| 1990 | 4 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 3 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 8 | 0 |
| 1999 | 4 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 2 |
| 2002 | 3 | 1 |
| 2003 | 0 | 1 |
| 2004 | 1 | 2 |
| 2005 | 2 | 1 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
| 2011 | 0 | 0 |
| 2012 | 1 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 2 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 2 |
| 2019 | 1 | 2 |
| 2020 | 1 | 2 |
| 2021 | 1 | 0 |
| 2022 | 0 | 1 |
| 2023 | 0 | 1 |
| 2024 | 1 | 2 |
| 2025 | 2 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Pattern forming method, resist material, and pattern forming apparatus21 Oct 2025US 12,449,737 B2Oji Holdings Corporation
- Photoresist composition and method of forming photoresist pattern11 Feb 2025US 12,222,647 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photoresist composition and method of forming photoresist pattern30 Apr 2024US 11,971,659 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photosensitive compositions, color filter and microlens derived therefrom9 Feb 2021US 10,915,019 B2Promerus, LLC
- Resist composition, method of forming resist pattern, compound, and acid generator12 May 2020US 10,649,330 B2Tokyo Ohka Kogyo.Co., Ltd.
- Photoresist composition and method of forming photoresist pattern22 May 2025US 2025/0164881 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Polyimides having low dielectric loss23 May 2024US 2024/0166818 A1Solvay Specialty Polymers Italy S.P.A.
- Polyimides having low dielectric loss9 May 2024US 2024/0150524 A1Solvay Specialty Polymers Italy S.P.A.
- Photoresist composition and method of forming photoresist pattern26 Jan 2023US 2023/0028673 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Pattern forming method, resist material, and pattern forming apparatus17 Nov 2022US 2022/0365448 A1Oji Holdings Corporation
Most cited
By later US patents
- Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent77US 5,212,043 ATosho, Inc. · 1993
- Photosensitive compositions and a method of patterning using the same68US 4,740,451 ATokyo Ohka Kogyo.Co., Ltd. · 1988
- Photosensitive resin composition and color filter comprising a polymer dyeable with an anionic dye, an azide compound and a compound with at least two acrylol groups61US 5,190,845 ANippon Kayaku Kabushiki Kaisha · 1993
- Polyvinyl acetal with hydroxy aliphatic acetal groups useful in photosensitive negative working compositions46US 4,940,646 AHoechst Aktiengesellschaft · 1990
- Polymers containing N-substituted maleimide units and their use in radiation-sensitive mixtures39US 6,190,825 B1Agfa-Gevaert · 2001