G03F 7/008
Azides
Official title: Azides (G03F7/075 takes precedence)
G03F7/008 (Azides) appears on 196 US grants and 65 published applications in this corpus.
Search patents in G03F- Granted patents
- 196
- Published applications
- 65
- Assignees
- 108
- Inventors
- 441
- Latest grant
- 2 Dec 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 3 | 0 |
| 1978 | 6 | 0 |
| 1979 | 2 | 0 |
| 1980 | 5 | 0 |
| 1981 | 7 | 0 |
| 1982 | 4 | 0 |
| 1983 | 4 | 0 |
| 1984 | 8 | 0 |
| 1985 | 4 | 0 |
| 1986 | 10 | 0 |
| 1987 | 4 | 0 |
| 1988 | 9 | 0 |
| 1989 | 8 | 0 |
| 1990 | 6 | 0 |
| 1991 | 5 | 0 |
| 1992 | 2 | 0 |
| 1993 | 10 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 4 | 0 |
| 1997 | 4 | 0 |
| 1998 | 10 | 0 |
| 1999 | 9 | 0 |
| 2000 | 8 | 0 |
| 2001 | 8 | 4 |
| 2002 | 5 | 2 |
| 2003 | 3 | 1 |
| 2004 | 2 | 5 |
| 2005 | 3 | 1 |
| 2006 | 1 | 7 |
| 2007 | 1 | 1 |
| 2008 | 1 | 1 |
| 2009 | 2 | 3 |
| 2010 | 2 | 0 |
| 2011 | 0 | 2 |
| 2012 | 1 | 2 |
| 2013 | 1 | 2 |
| 2014 | 0 | 1 |
| 2015 | 5 | 2 |
| 2016 | 0 | 1 |
| 2017 | 2 | 1 |
| 2018 | 1 | 5 |
| 2019 | 1 | 5 |
| 2020 | 2 | 4 |
| 2021 | 4 | 4 |
| 2022 | 2 | 2 |
| 2023 | 2 | 3 |
| 2024 | 4 | 2 |
| 2025 | 4 | 2 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same2 Dec 2025US 12,487,521 B2Lawrence Livermore National Security, LLC
- Pattern forming method, resist material, and pattern forming apparatus21 Oct 2025US 12,449,737 B2Oji Holdings Corporation
- Photosensitive, inorganic ligand-capped inorganic nanocrystals25 Mar 2025US 12,259,651 B2The University of Chicago
- Photoresist composition and method of forming photoresist pattern11 Feb 2025US 12,222,647 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photocurable composition and method for producing semiconductor device19 Nov 2024US 12,147,158 B2Nissan Chemical Corporation
- Material for forming superfine pattern, photosensitive resin composition, pattern treatment composition and formation method of superfine pattern19 Feb 2026US 2026/0050215 A1Advanced Echem Materials Company Limited
- Semiconductor photoresist composition and method of forming patterns using the composition15 Jan 2026US 2026/0016748 A1Samsung Electronics Co., Ltd.
- Positive photosensitive resin composition, cured product of the same, and display device including the same19 Jun 2025US 2025/0199402 A1Toray Industries, Inc.
- Photoresist composition and method of forming photoresist pattern22 May 2025US 2025/0164881 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Polyimides having low dielectric loss23 May 2024US 2024/0166818 A1Solvay Specialty Polymers Italy S.P.A.
Most cited
By later US patents
- Molecularly imprinted materials, method for their preparation and devices employing such materials249US 5,587,273 AAdvanced Microbotics Corporation · 1996
- 3- and 4-Azidophthalic acid derivatives78US 4,250,096 ACiba-Geigy Corporation · 1981
- Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent77US 5,212,043 ATosho, Inc. · 1993
- Photosensitive material71US 4,424,325 ADaikin Kogyo Co., Ltd. · 1984
- Photosensitive compositions and a method of patterning using the same68US 4,740,451 ATokyo Ohka Kogyo.Co., Ltd. · 1988