G03F 7/0085
Characterised by the non-macromolecular additives
Official title: {characterised by the non-macromolecular additives}
G03F7/0085 (Characterised by the non-macromolecular additives) appears on 38 US grants and 18 published applications in this corpus.
Search patents in G03F- Granted patents
- 38
- Published applications
- 18
- Assignees
- 27
- Inventors
- 79
- Latest grant
- 9 Apr 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 3 | 0 |
| 1982 | 2 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 4 | 0 |
| 2002 | 1 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 4 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 2 |
| 2010 | 0 | 0 |
| 2011 | 0 | 1 |
| 2012 | 1 | 1 |
| 2013 | 0 | 2 |
| 2014 | 0 | 1 |
| 2015 | 3 | 0 |
| 2016 | 0 | 1 |
| 2017 | 1 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 0 |
| 2020 | 1 | 2 |
| 2021 | 0 | 2 |
| 2022 | 1 | 0 |
| 2023 | 0 | 0 |
| 2024 | 2 | 0 |
| 2025 | 0 | 0 |
| 2026 | 0 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Photosensitive composition9 Apr 2024US 11,953,831 B2FUJIFILM Corporation
- Three-dimensional crosslinker composition and method of manufacturing electronic devices using the same2 Jan 2024US 11,860,536 B2Unist (Ulsan National Institute of Science and Technology)
- Photoresist material, method of fabcricating same, and color filter substrate22 Nov 2022US 11,506,975 B2Tcl China Star Optoelectronics Technology Co., Ltd.
- Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same4 Aug 2020US 10,732,502 B2Lawrence Livermore National Security, LLC
- Photoresists and methods for use thereof30 May 2017US 9,665,001 B2Rohm and Haas Electronic Materials LLC
- Material for forming superfine pattern, photosensitive resin composition, pattern treatment composition and formation method of superfine pattern19 Feb 2026US 2026/0050215 A1Advanced Echem Materials Company Limited
- Three-dimensional crosslinker composition and method of manufacturing electronic devices using the same23 Dec 2021US 2021/0397087 A1Ulsan National Institute of Science and Technology
- Photoresist material, method of fabcricating same, and color filter substrate15 Jul 2021US 2021/0216011 A1Tcl China Star Optoelectronics Technology Co., Ltd.
- Photosensitive composition17 Dec 2020US 2020/0393759 A1FUJIFILM Corporation
- Photoresist composition for line doubling9 Jan 2020US 2020/0012188 A1
Most cited
By later US patents
- Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers48US 4,147,552 AEastman Kodak Company · 1979
- Optically oriented photoresist pattern forming method using organic crystal in photoresist layer with specified refracting indices formula28US 4,996,123 AMatsushita Electric Industrial Co., Ltd. · 1991
- Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent27US 5,405,720 AJapan Synthetic Rubber Co., Ltd. · 1995
- 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent23US 5,215,857 AJapan Synthetic Rubber Co., Ltd. · 1993
- Sensitizers for photocrosslinkable polymers17US 4,062,686 AEastman Kodak Company · 1977