Back to results
US 11,953,831 B2Granted
Photosensitive composition
AssigneeFUJIFILM Corporation
InventorsShoichi Nakamura, Takahiro Okawara, Yuki Nara
Life of this patent
Estimating the term…
Abstract
Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.
Claims16
A photosensitive composition for pulse exposure comprising:
- a coloring material A;
- a photoradical polymerization initiator B;
- and
- a radically polymerizable compound C,
- wherein a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C, and
- the radically polymerizable compound C1 includes a repeating unit having an ethylenically unsaturated bond group at a side chain and a repeating unit having a graft chain.
3 more elements
Dependencies are inferred from the claim text.