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US 2021/0216011 A1Published application
Photoresist material, method of fabcricating same, and color filter substrate
AssigneeTcl China Star Optoelectronics Technology Co., Ltd.
InventorLin AI
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Abstract
A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: wherein a value of n is 1 to 2.
Claims10
A photoresist material, comprising an oligomer segment having a chemical structural formula of:
- wherein a value of n is 1 to 2.
A method of fabricating a photoresist material, comprising:
- dissolving and stirring compound 1 in tetrahydrofuran to form a first solution, adding sodium hydride to the first solution to form a second solution, and adding compound 2 to the second solution to stir at 60° C. for 6 hours so as to obtain compound 3 after purifying and isolating;
- wherein a chemical structure of the compound 1 is:
- wherein a chemical structure of the compound 2 is:
- and
- wherein a chemical structure of the compound 3 is:
2 more elements
Dependencies are inferred from the claim text.