Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsYoshihiro Hosaka, Ikuo Nozue, Masashige Takatori, Yoshiyuki Harita
Life of this patent
Estimating the term…
Abstract
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
Claims11
A radiation-sensitive resin single phase composition, comprising a solution of 100 parts by weight of an alkali-soluble resin and 5 to 100 parts by weight of a 1,2-quinonediazide compound as a radiation-sensitive compound in a solvent, comprising a monooxymonocarboxylic acid ester having formula (I):
- R.sup.1 --O--R.sup.2 --COOR.sup.3 (I)
- wherein R.sup.1 is a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or an acyl group having 1 to 4 carbon atoms;
- R.sup.2 is a methylene group, an alkylene group having 2 to 4 carbon atoms or an alkylidene group having 2 to 4 carbon atoms;
- and R.sup.3 is an alkyl group having 1 or 2 carbon atoms, and wherein the amount of the solvent containing said monooxymonocarboxylic acid ester is 40 to 90% by weight of the composition,
- and wherein said compound of formula (I) is present in such an amount that a radiation-sensitive resist can be prepared from said composition.
A radiation-sensitive resin single phase composition, comprising a solution of 100 parts by weight of an alkali-soluble resin and 5 to 100 parts by weight of a 1,2-quinonediazide compound as a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester having formula (I):
- R.sup.1 --O--R.sup.2 --COOR.sup.3 (I)
- wherein R.sup.1 is a hydrogen atom, an alkyl group having 1 or 2 carbon atoms;
- R.sup.2 is a methylene group, an alkylene group having 2 carbon atoms or an alkylidene group having 2 to 4 carbon atoms;
- and R.sup.+ is an alkyl group having 1 or 2 carbon atoms, and wherein the amount of solvent containing said monooxymonocarboxylic acid ester is 40 to 90% by weight of the composition,
- and wherein said compound of formula (I) is present in such an amount that a radiation-sensitive resist can be prepared from said composition.
Dependencies are inferred from the claim text.