Back to results
US 11,506,975 B2Granted
Photoresist material, method of fabcricating same, and color filter substrate
AssigneeTcl China Star Optoelectronics Technology Co., Ltd.
InventorLin Ai
Life of this patent
Estimating the term…
Abstract
A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: wherein a value of n is 1 to 2.
Claims9
A photoresist material, comprising an oligomer segment having a chemical structural formula of:
- wherein a value of n is 1 to 2;
- wherein, R comprises:
- at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles.
A method of fabricating a photoresist material, comprising:
- dissolving and stirring compound 1 in tetrahydrofuran to form a first solution, adding sodium hydride to the first solution to form a second solution, and adding compound 2 to the second solution to stir at 60° C. for 6 hours so as to obtain compound 3 after purifying and isolating;
- wherein a chemical structure of the compound 1 is:
- wherein a chemical structure of the compound 2 is:
- and wherein a chemical structure of the compound 3 is:
1 more element
Dependencies are inferred from the claim text.