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US 2020/0393759 A1Published application
Photosensitive composition
AssigneeFUJIFILM Corporation
InventorsShoichi NAKAMURA, Takahiro OKAWARA, Yuki NARA
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Abstract
Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.
Claims18
A photosensitive composition for pulse exposure comprising:
- a coloring material A;
- a photoradical polymerization initiator B;
- and
- a radically polymerizable compound C,
- wherein a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.
2 more elements
Dependencies are inferred from the claim text.