Photosensitive material
AssigneeDaikin Kogyo Co., Ltd.
InventorsTakahiro Tsunoda, Tsuguo Yamaoka, Sinji Tamura
Life of this patent
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Abstract
A copolymer comprising (a) a monomer having a C.sub.7 to C.sub.21 perfluoroalkyl or perfluoroalkenyl group at one end of the molecule and an ethylenically unsaturated group at the other end of the molecule, and (b) a monomer having a photosensitive group, e.g. an azidobenzoyloxy group, cinnamoyloxy group, benzoylphenyl group or .alpha.,.beta.-unsaturated ketone group. The copolymer has an excellent photosensitivity and excellent water and oil repellent properties, and is useful for various purposes, e.g. as a photosensitive material for dry offset printing plate or resist and as a photo-curable, water and oil repelling coating material.
Claims3
A copolymer comprising:
- at most 75% by mole of a vinyl monomer copolymerizable with monomers (a) and (b), as defined below;
- at least 20% by mole of a monomer (a) having a perfluoroalkyl group or perfluoroalkenyl group at one end of the monomer and an ethylenically unsaturated group selected from the group consisting of acryloyloxy, methacryloyloxy, acryloylamino, methacryloylamino, vinyl ether and .alpha.-methylvinyl, at the other end of the monomer;
- a bivalent group containing --(CH.sub.2).sub.n -- linking the both end groups, monomer (a) is a compound having the following general formula (I):
- R.sub.f B.sub.m (CH.sub.2).sub.n --X--CR.dbd.CH.sub.2 (I)
- in which R.sub.f is a perfluoroalkyl group or perfluoroalkenyl group having 7 to 21 carbon atoms;
- B is a bivalent group linking the R.sub.f group and the --(CH.sub.2).sub.n -- group selected from the group consisting of --CO--, --SO.sub.2 --, --O--, --(CH.sub.2).sub.3 --O--, --S--, --(CH.sub.2).sub.p --NR.sup.1 --, --CO--NR.sup.1 --, --SO.sub.2 --NR.sup.1 --, ##STR29## wherein R.sup.1 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and p is an integer of 1 to 6;
- R is hydrogen or methyl group;
- X is a single bond or a bivalent group selected from the group consisting of --O--, --OCO--, --COO--, --NHCO-- and --CO--;
- m is 0 or 1;
- and n is an integer of 1 to 10;
- and
- at least 5% by mole of an ethylenically unsaturated monomer (b) having a photosensitive group, wherein the photosensitive group is a member selected from the group consisting of:
- an azidobenzoyloxy group of the formula (1):
- ##STR30## in which Y is hydrogen, an alkyl group having 1 to 5 carbon atoms, an alkoxyl group having 1 to 5 carbon atoms, nitro group, chlorine or bromine,
- a cinnamic acid residue of the formula (2):
- ##STR31## a benzoylphenyl group of the formula (3):
- ##STR32## and a group containing an .alpha.,.beta.-unsaturated ketone of the formula (4):
- --COCH.dbd.CH--(4)
- the photosensitive group containing the .alpha.,.beta.-unsaturated ketone of formula (4) being selected from the group consisting of cinnamoylphenyl group of the formula:
- ##STR33## benzoylvinylphenyl group of the formula:
- ##STR34## ' -methoxy-4'-(1-buten-3-onyl)-phenyl group of the formula:
- ##STR35## benzoylvinylbenzoyloxy group of the formula:
- ##STR36## and a cinnamoyl group of the general formula:
- ##STR37## in which Y is as defined above.
Dependencies are inferred from the claim text.