G03F 7/0047
Characterised by additives for obtaining a metallic or ceramic pattern
Official title: {characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing}
G03F7/0047 (Characterised by additives for obtaining a metallic or ceramic pattern) appears on 517 US grants and 724 published applications in this corpus.
Search patents in G03F- Granted patents
- 517
- Published applications
- 724
- Assignees
- 284
- Inventors
- 1,565
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 2 | 0 |
| 1990 | 6 | 0 |
| 1991 | 8 | 0 |
| 1992 | 6 | 0 |
| 1993 | 3 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 2 | 0 |
| 1997 | 6 | 0 |
| 1998 | 4 | 0 |
| 1999 | 5 | 0 |
| 2000 | 7 | 0 |
| 2001 | 9 | 3 |
| 2002 | 9 | 20 |
| 2003 | 10 | 24 |
| 2004 | 18 | 32 |
| 2005 | 12 | 29 |
| 2006 | 18 | 40 |
| 2007 | 20 | 17 |
| 2008 | 17 | 36 |
| 2009 | 14 | 30 |
| 2010 | 18 | 23 |
| 2011 | 16 | 17 |
| 2012 | 14 | 12 |
| 2013 | 15 | 15 |
| 2014 | 16 | 16 |
| 2015 | 15 | 33 |
| 2016 | 19 | 23 |
| 2017 | 15 | 41 |
| 2018 | 17 | 45 |
| 2019 | 25 | 50 |
| 2020 | 26 | 33 |
| 2021 | 31 | 45 |
| 2022 | 17 | 32 |
| 2023 | 29 | 30 |
| 2024 | 21 | 35 |
| 2025 | 27 | 27 |
| 2026 | 6 | 16 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Methods and materials for metallic photoresist25 Aug 2026US 12,717,229 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Microwave treatment of replicated optical structures11 Aug 2026US 12,704,658 B2NILT Switzerland GmbH
- Composition including quantum dot, manufacturing method quantum dot and color filter9 Jun 2026US 12,650,643 B2Samsung SDI.Co., Ltd.
- Conductive film, touch panel, photosensitive resin composition, and method of manufacturing conductive film3 Mar 2026US 12,567,515 B2FUJIFILM Corporation
- Additive manufacturing processes employing a material featuring properties of a soft bodily tissue20 Jan 2026US 12,528,244 B2Stratasys, Inc.
- Milled silica and liquid radiation curable compositions comprising same16 Jul 2026US 2026/0201185 A1Evonik Operations GmbH
- Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing semiconductor package or printed wiring board2 Jul 2026US 2026/0186413 A1
- Method for producing printed wiring board, photosensitive resin composition, photosensitive resin film, printed wiring board, and semiconductor package2 Jul 2026US 2026/0190248 A1Resonac Corporation
- Photosensitive resin composition, photosensitive resin film, patterning process, and light emitting device25 Jun 2026US 2026/0177916 A1Shin-Etsu Chemical Co., Ltd.
- Photosensitive resin composition, photosensitive resin film, photosensitive dry film, patterning process, and light emitting device25 Jun 2026US 2026/0177918 A1Shin-Etsu Chemical Co., Ltd.
Most cited
By later US patents
- Stereolithography resin for rapid prototyping of ceramics and metals126US 6,117,612 AThe Regents of the University of Michigan · 2000
- Paste compositions105US 5,173,457 AJohnson Matthey Public Limited Company · 1992
- Three dimensional sintered inorganic structures using photopolymerization104US 5,496,682 AW. R. Grace & Co.-Conn. · 1996
- Photosensitive semiconductor nanocrystals, photosensitive composition comprising semiconductor nanocrystals and method for forming semiconductor nanocrystal pattern using the same74US 7,199,393 B2Samsung Electronics Co., Ltd. · 2007
- Radiation patternable functional materials, methods of their use, and structures formed therefrom57US 7,294,449 B1Kovio, Inc. · 2007